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A Kinetic Model of Membrane Formation by CVD of SiO_2 and Al_2O_3

Tsapatsis, Michael and Gavalas, George R. (1992) A Kinetic Model of Membrane Formation by CVD of SiO_2 and Al_2O_3. AIChE Journal, 38 (6). pp. 847-856. ISSN 0001-1541. doi:10.1002/aic.690380606. https://resolver.caltech.edu/CaltechAUTHORS:20151104-095847610

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Abstract

Silica and alumina layers deposited onto the walls of porous Vycor tubes by chloride hydrolysis in an opposing reactants geometry have been characterized by scanning electron microscopy and electron microprobe analysis. The layers are asymmetric, having a long tail toward the side of the chloride flow and a sharp boundary at the other side. The deposit thickness is several tenths of microns, while the totally plugged region is of order of 1 micron. A model has been developed describing reaction, diffusion and evolution of the porous structure in the Vycor substrate due to the accumulation of the solid product. The deposition reaction is described by transient kinetics in terms if the concentrations of silanol and chloride groups in the product layer, as well as the concentrations of the gaseous reactants. The model is capable of generating deposit profiles in good agreement with those measured by electron microprobe analysis.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1002/aic.690380606DOIArticle
http://onlinelibrary.wiley.com/doi/10.1002/aic.690380606/abstractPublisherArticle
ORCID:
AuthorORCID
Tsapatsis, Michael0000-0001-5610-3525
Gavalas, George R.0000-0003-1468-6835
Additional Information:© 1992 American Institute of Chemical Engineers. Manuscript received Nov. 27, 1991, and revision received Mar, 19, 1992. Dr. S. W. Nam contributed in the development of the homogeneous model. Support was provided by the Department of Energy with UCR Grant DE-FG22-89PC89765 and Contract DE-AC21-90MC26365.
Funders:
Funding AgencyGrant Number
Department of Energy (DOE)DE-FG22-89PC89765
Department of Energy (DOE)DE-AC21-90MC26365
Issue or Number:6
DOI:10.1002/aic.690380606
Record Number:CaltechAUTHORS:20151104-095847610
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20151104-095847610
Official Citation:Tsapatsis, M. and Gavalas, G. R. (1992), A kinetic model of membrane formation by CVD of SiO2 and Al2O3. AIChE J., 38: 847–856. doi: 10.1002/aic.690380606
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:61810
Collection:CaltechAUTHORS
Deposited By: Ruth Sustaita
Deposited On:04 Nov 2015 19:25
Last Modified:10 Nov 2021 22:54

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