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Ion Implantation Studies in Silicon

Eriksson, L. and Davies, J. A. and Mayer, J. W. (1969) Ion Implantation Studies in Silicon. Science, 163 (3868). pp. 627-633. ISSN 0036-8075. doi:10.1126/science.163.3868.627.

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"Channeling" techniques have been applied to the study of ion implantation in silicon.

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Additional Information:© 1969 American Association for the Advancement of Science.
Issue or Number:3868
Record Number:CaltechAUTHORS:20151211-155449249
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Official Citation:Ion Implantation Studies in Silicon L. Eriksson, J. A. Davies, and J. W. Mayer Science 14 February 1969: 163 (3868), 627-633. [DOI:10.1126/science.163.3868.627]
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:62831
Deposited By: Tony Diaz
Deposited On:11 Dec 2015 23:58
Last Modified:10 Nov 2021 23:07

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