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Charge Migration along the DNA Duplex: Hole versus Electron Transport

Elias, Benjamin and Shao, Fangwei and Barton, Jacqueline K. (2008) Charge Migration along the DNA Duplex: Hole versus Electron Transport. Journal of the American Chemical Society, 130 (4). pp. 1152-1153. ISSN 0002-7863. doi:10.1021/ja710358p.

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Cyclometalated Ir(III) complexes tethered to 18-mer oligonucleotides through a functionalized dipyridophenazine ligand have been used to study the distance dependence profile of hole and electron transport along DNA. These DNA assemblies allow a direct comparison of hole and electron transport with a single donor coupled into the base stack. Interestingly, both processes, monitored with modified bases as hole or electron kinetic traps incorporated in the strands, appear to have similarly shallow dependences in their reactions with distance. As with hole transport, perturbations to the base stack also attenuate electron transport.

Item Type:Article
Related URLs:
URLURL TypeDescription
Elias, Benjamin0000-0001-5037-3313
Shao, Fangwei0000-0003-2007-3920
Barton, Jacqueline K.0000-0001-9883-1600
Additional Information:© 2008 American Chemical Society. Received November 15, 2007. Publication Date (Web): January 10, 2008. We are grateful to the NIH (Grant GM49216) for their financial support. B.E. also thanks the Département des Relations Internationales de l’Université Libre de Bruxelles (Prix Rayonnement International) and the Fondation L. de Bay for postdoctoral fellowships.
Funding AgencyGrant Number
Université Libre de BruxellesUNSPECIFIED
Fondation L. de BayUNSPECIFIED
Issue or Number:4
Record Number:CaltechAUTHORS:20160226-135926234
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Official Citation:Charge Migration along the DNA Duplex:  Hole versus Electron Transport Benjamin Elias, Fangwei Shao, and Jacqueline K. Barton Journal of the American Chemical Society 2008 130 (4), 1152-1153 DOI: 10.1021/ja710358p
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:64807
Deposited By: Ruth Sustaita
Deposited On:29 Feb 2016 18:10
Last Modified:10 Nov 2021 23:35

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