Giuliano, C. R. and Marburger, J. H. and Yariv, A. (1972) Enhancement of self-focusing threshold in sapphire with elliptical beams. Applied Physics Letters, 21 (2). pp. 58-60. ISSN 0003-6951. https://resolver.caltech.edu/CaltechAUTHORS:GIUapl72
![[img]](https://authors.library.caltech.edu/style/images/fileicons/application_pdf.png)
|
PDF
See Usage Policy. 262Kb |
Use this Persistent URL to link to this item: https://resolver.caltech.edu/CaltechAUTHORS:GIUapl72
Abstract
The power threshold for optically induced bulk damage in sapphire is a sensitive function of the ellipticity of the incident beam shape. Experimental results are consistent with a simple self-focusing theory.
| Item Type: | Article | ||||||
|---|---|---|---|---|---|---|---|
| Related URLs: |
| ||||||
| Additional Information: | ©1972 The American Institute of Physics. Received 30 March 1972. The authors are grateful to V. Evtuhov for helpful discussions and for providing English translations of Ref. 2 and 3. Work supported in part by the Advanced Research Projects Agency under ARPA Order No. 1434 with Air Force Cambridge Research Laboratories. | ||||||
| Issue or Number: | 2 | ||||||
| Record Number: | CaltechAUTHORS:GIUapl72 | ||||||
| Persistent URL: | https://resolver.caltech.edu/CaltechAUTHORS:GIUapl72 | ||||||
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | ||||||
| ID Code: | 7076 | ||||||
| Collection: | CaltechAUTHORS | ||||||
| Deposited By: | Tony Diaz | ||||||
| Deposited On: | 08 Jan 2007 | ||||||
| Last Modified: | 02 Oct 2019 23:38 |
Repository Staff Only: item control page
