Giuliano, C. R. and Marburger, J. H. and Yariv, A. (1972) Enhancement of self-focusing threshold in sapphire with elliptical beams. Applied Physics Letters, 21 (2). pp. 58-60. ISSN 0003-6951. http://resolver.caltech.edu/CaltechAUTHORS:GIUapl72
![[img]](https://authors.library.caltech.edu/style/images/fileicons/application_pdf.png)
|
PDF
See Usage Policy. 262Kb |
Use this Persistent URL to link to this item: http://resolver.caltech.edu/CaltechAUTHORS:GIUapl72
Abstract
The power threshold for optically induced bulk damage in sapphire is a sensitive function of the ellipticity of the incident beam shape. Experimental results are consistent with a simple self-focusing theory.
| Item Type: | Article |
|---|---|
| Additional Information: | ©1972 The American Institute of Physics. Received 30 March 1972. The authors are grateful to V. Evtuhov for helpful discussions and for providing English translations of Ref. 2 and 3. Work supported in part by the Advanced Research Projects Agency under ARPA Order No. 1434 with Air Force Cambridge Research Laboratories. |
| Record Number: | CaltechAUTHORS:GIUapl72 |
| Persistent URL: | http://resolver.caltech.edu/CaltechAUTHORS:GIUapl72 |
| Alternative URL: | http://dx.doi.org/10.1063/1.1654278 |
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. |
| ID Code: | 7076 |
| Collection: | CaltechAUTHORS |
| Deposited By: | Tony Diaz |
| Deposited On: | 08 Jan 2007 |
| Last Modified: | 26 Dec 2012 09:28 |
Repository Staff Only: item control page
