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Exposure schedule for multiplexing holograms in photopolymer films

Pu, Allen and Curtis, Kevin and Psaltis, Demetri (1996) Exposure schedule for multiplexing holograms in photopolymer films. Optical Engineering, 35 (10). pp. 2824-2829. ISSN 0091-3286. doi:10.1117/1.600967. https://resolver.caltech.edu/CaltechAUTHORS:20161005-152423097

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Abstract

An iterative method is introduced for determining the exposure schedule for multiplexing holograms in saturable recording materials, such as photopolymers. This method is designed to share all or part of the available dynamic range of the recording material among the holograms to be multiplexed. Using exposure schedules derived from this method, the authors find that the diffraction efficiency of DuPont’s HRF‐150 38‐ and 100‐μm photopolymer scale is (2.2/M)^2 and (6.5/M)^2 respectively, where M is the number of holograms recorded. Finally, 1000 holograms were multiplexed at a single location in the 100‐μm thick photopolymer using an exposure schedule derived with this method.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1117/1.600967DOIArticle
http://opticalengineering.spiedigitallibrary.org/article.aspx?articleid=1074438PublisherArticle
Additional Information:© 1996 Society of Photo−Optical Instrumentation Engineers. Paper 31125 received Dec. 21, 1995; accepted for publication Mar. 19, 1996. We would like to thank Geoffrey Burr for all his helpful comments. We gratefully acknowledge the support of the Air Force Office of Science Research and the National Science Foundation Engineering Research Center, Center for Neuromorphic Systems Engineering for this work.
Funders:
Funding AgencyGrant Number
Air Force Office of Scientific Research (AFOSR)UNSPECIFIED
NSFUNSPECIFIED
Center for Neuromorphic Systems Engineering, CaltechUNSPECIFIED
Subject Keywords:holographic data storage; exposure schedule; photopolymer; M-number
Issue or Number:10
DOI:10.1117/1.600967
Record Number:CaltechAUTHORS:20161005-152423097
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20161005-152423097
Official Citation:Allen Pu ; Kevin Curtis and Demetri Psaltis "Exposure schedule for multiplexing holograms in photopolymer films", Opt. Eng. 35(10), 2824-2829 (Oct 01, 1996). ; http://dx.doi.org/10.1117/1.600967
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:70892
Collection:CaltechAUTHORS
Deposited By: George Porter
Deposited On:14 Oct 2016 01:51
Last Modified:11 Nov 2021 04:36

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