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Electron Diffraction Study of Trifluoromethyl Iodide

Wong, Chi-hsiang and Schomaker, Verner (1958) Electron Diffraction Study of Trifluoromethyl Iodide. Journal of Chemical Physics, 28 (6). pp. 1010-1013. ISSN 0021-9606. doi:10.1063/1.1744335.

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A reinvestigation of CF_3I by electron diffraction for this molecule has confirmed the complex atomic scattering factors of Ibers and Hoerni. The structural parameters agree with those reported from earlier, inconclusive determinations.

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Additional Information:© 1958 American Institute of Physics. (Received November 29, 1957) This work was supported by the Office of Naval Research under Contract N6onr-24423.
Funding AgencyGrant Number
Office of Naval Research (ONR)N6onr-24423
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Other Numbering System NameOther Numbering System ID
Gates and Crellin Laboratories of Chemistry2282
Issue or Number:6
Record Number:CaltechAUTHORS:20161017-111309761
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Official Citation:Electron Diffraction Study of Trifluoromethyl Iodide Wong, Chi‐hsiang and Schomaker, Verner, The Journal of Chemical Physics, 28, 1010-1013 (1958), DOI:
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:71170
Deposited By: George Porter
Deposited On:17 Oct 2016 20:23
Last Modified:11 Nov 2021 04:40

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