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Electron Diffraction Study of Trifluoromethyl Iodide

Wong, Chi-hsiang and Schomaker, Verner (1958) Electron Diffraction Study of Trifluoromethyl Iodide. Journal of Chemical Physics, 28 (6). pp. 1010-1013. ISSN 0021-9606. https://resolver.caltech.edu/CaltechAUTHORS:20161017-111309761

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Abstract

A reinvestigation of CF_3I by electron diffraction for this molecule has confirmed the complex atomic scattering factors of Ibers and Hoerni. The structural parameters agree with those reported from earlier, inconclusive determinations.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1063/1.1744335DOIArticle
http://scitation.aip.org/content/aip/journal/jcp/28/6/10.1063/1.1744335PublisherArticle
Additional Information:© 1958 American Institute of Physics. (Received November 29, 1957) This work was supported by the Office of Naval Research under Contract N6onr-24423.
Funders:
Funding AgencyGrant Number
Office of Naval Research (ONR)N6onr-24423
Other Numbering System:
Other Numbering System NameOther Numbering System ID
Gates and Crellin Laboratories of Chemistry2282
Issue or Number:6
Record Number:CaltechAUTHORS:20161017-111309761
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20161017-111309761
Official Citation:Electron Diffraction Study of Trifluoromethyl Iodide Wong, Chi‐hsiang and Schomaker, Verner, The Journal of Chemical Physics, 28, 1010-1013 (1958), DOI:http://dx.doi.org/10.1063/1.1744335
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:71170
Collection:CaltechAUTHORS
Deposited By: George Porter
Deposited On:17 Oct 2016 20:23
Last Modified:03 Oct 2019 16:04

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