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Tuning parameters of metal ion implantation within a microfluidic channel

Choi, Jae-Woo and Rosset, Samuel and Niklaus, Muhamed and Adleman, James R. and Shea, Herbert and Psaltis, Demetri (2010) Tuning parameters of metal ion implantation within a microfluidic channel. In: Microfluidics, BioMEMS, and Medical Microsystems VIII. Proceedings of SPIE. No.7593. Society of Photo-Optical Instrumentation Engineers , Bellingham, WA, Art. No. 75930D. ISBN 978-0-8194-7989-1. https://resolver.caltech.edu/CaltechAUTHORS:20161107-142130622

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Abstract

Applying electrical fields is a simple and versatile method to manipulate and reconfigure optofluidic devices. Several methods to apply electric fields using electrodes on polymers or in the context of lab-on-a-chip devices exist. In this paper, we utilize an ion-implanted process to pattern electrodes within a fluidic channel made of polydimethylsiloxane (PDMS). Electrode structuring within the channel is achieved by ion implantation at a 40° angle with a metal shadow mask. In previous work using the ion-implantation process, we demonstrated two possible applications in the context of lab-on-a-chip applications. Asymmetric particles were aligned through electro-orientation. Colloidal focusing and concentration was possible with negative dielectrophoresis. In this paper, we discuss the different electrode structures that are possible by changing the channel dimensions. A second parameter of ion implantation dosage prevents the shorting of electrodes on the side wall or top wall of the fluidic channel to the bottom. This allows for floating electrodes on the side wall or top wall. These type of electrodes help prevent electrolysis as the liquid is not in direct contact with the voltage source. Possible applications of the different electrode structures that are possible are discussed.


Item Type:Book Section
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1117/12.842025DOIArticle
http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1337612PublisherArticle
Additional Information:© 2010 SPIE. The authors would like to thank Claude Amendola for cutting the steel metal mask, CMI staff for assistance with SU-8 photolithography process, Rachel Grange and Chia-lung Hsieh for confocal microscope assistance, and Andreas Vasdekis and Wuzhou Song for fluorescence microscope assistance.
Subject Keywords:ion implantation, microfluidics, optofluidics, dielectrophoresis, electro-orientation, polydimethylsiloxane, electric field, bacteria
Series Name:Proceedings of SPIE
Issue or Number:7593
Record Number:CaltechAUTHORS:20161107-142130622
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20161107-142130622
Official Citation:Jae-Woo Choi ; Samuel Rosset ; Muhamed Niklaus ; James R. Adleman ; Herbert Shea ; Demetri Psaltis; Tuning parameters of metal ion implantation within a microfluidic channel. Proc. SPIE 7593, Microfluidics, BioMEMS, and Medical Microsystems VIII, 75930D (February 17, 2010); doi:10.1117/12.842025
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:71776
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:07 Nov 2016 22:36
Last Modified:03 Oct 2019 16:11

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