Lee, Hyo-Chang and Seo, B. H. and Kwon, Deuk-Chul and Kim, J. H. and Seong, D. J. and Oh, S. J. and Chung, C.-W. and You, K. H. and Shin, ChaeHo (2017) Evolution of electron temperature in inductively coupled plasma. Applied Physics Letters, 110 (1). Art. No. 014106. ISSN 0003-6951. doi:10.1063/1.4971980. https://resolver.caltech.edu/CaltechAUTHORS:20170109-095348152
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Abstract
It is generally recognized that the electron temperature T_e either remains constant or decreases slightly with plasma power (plasma density). This trend can be simply verified using a single-step or multi-step fluid global model. In this work, however, we experimentally observed that T_e evolved with plasma power in radio frequency (RF) inductively coupled plasmas. In this experiment, the measured electron energy distributions were nearly Maxwellian distribution. In the low RF power regime, T_e decreased with increasing plasma power, while it increased with plasma power in the high RF power regime. This evolution of T_e could be understood by considering the coupling effect between neutral gas heating and stepwise ionization. Measurement of gas temperature via laser Rayleigh scattering and calculation of T_e using the kinetic model, considering both multi-step ionization and gas heating, were in good agreement with the measured value of T_e. This result shows that T_e is in a stronger dependence on the plasma power.
Item Type: | Article | |||||||||
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Additional Information: | © 2016 AIP Publishing. Received 6 October 2016; accepted 27 November 2016; published online 6 January 2017. The authors thank anonymous reviewers. This research was supported by Korea Research Institute of Standard and Science (KRISS) and the R&D Convergence Program (CAP-16-04-KRISS) of National Research Council of Science and Technology (NST) of Republic of Korea, and also supported by R&D Program of “Plasma BigData ICT Convergence Technology Research Project” through the National Fusion Research Institute of Korea (NFRI) funded by the Government funds. | |||||||||
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Issue or Number: | 1 | |||||||||
DOI: | 10.1063/1.4971980 | |||||||||
Record Number: | CaltechAUTHORS:20170109-095348152 | |||||||||
Persistent URL: | https://resolver.caltech.edu/CaltechAUTHORS:20170109-095348152 | |||||||||
Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | |||||||||
ID Code: | 73327 | |||||||||
Collection: | CaltechAUTHORS | |||||||||
Deposited By: | Tony Diaz | |||||||||
Deposited On: | 09 Jan 2017 21:11 | |||||||||
Last Modified: | 11 Nov 2021 05:14 |
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