Zarem, H. A. and Hoenk, M. E. and Bridges, W. B. and Vahala, K. and Yariv, A. (1988) Generation of 1180 Å period gratings with a Xe ion laser. Electronics Letters, 24 (22). pp. 1366-1367. ISSN 0013-5194. https://resolver.caltech.edu/CaltechAUTHORS:ZARel88
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Abstract
Holographic lithography with the 2315 Å line of a xenon ion laser is used to produce gratings in polymethylmethacrylate. An 1180 Å period grating is made and examined with a scanning electron microscope (SEM). This grating period is appropriate for use as a first-order grating with a GaAs distributed feedback laser.
| Item Type: | Article | ||||||
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| Additional Information: | ©1988 IEE. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the IEE. | ||||||
| Issue or Number: | 22 | ||||||
| Record Number: | CaltechAUTHORS:ZARel88 | ||||||
| Persistent URL: | https://resolver.caltech.edu/CaltechAUTHORS:ZARel88 | ||||||
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | ||||||
| ID Code: | 737 | ||||||
| Collection: | CaltechAUTHORS | ||||||
| Deposited By: | Archive Administrator | ||||||
| Deposited On: | 22 Sep 2005 | ||||||
| Last Modified: | 09 Mar 2020 13:19 |
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