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Passivation and Secondary Functionalization of Allyl-Terminated Si(111) Surfaces

Plass, Katherine E. and Liu, Xueliang and Brunschwig, Bruce S. and Lewis, Nathan S. (2008) Passivation and Secondary Functionalization of Allyl-Terminated Si(111) Surfaces. Chemistry of Materials, 20 (6). pp. 2228-2233. ISSN 0897-4756. doi:10.1021/cm7024679.

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Synthesis of passivated silicon surfaces with tunable properties requires formation of a monolayer that includes a synthetically useful functional group, such as an alkene. Thus, Si(111) surfaces have been chemically and electrically passivated by attachment of an allyl monolayer. The structure of the monolayer was confirmed using infrared spectroscopy. The allyl-functionalized surface exhibited resistance to oxidation and had a low density of surface trap states. Metal-catalyzed reactions, in particular, Heck coupling and ruthenium-catalyzed olefin cross-metathesis, allowed attachment of small molecules despite the steric constraints of the dense surface-bound layer. Allyl-terminated silicon surfaces thus offer a means of attaching a variety of chemical moieties to a silicon surface through a short linking group, enabling applications in energy conversion, catalysis, and sensing.

Item Type:Article
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URLURL TypeDescription ItemSupporting Information
Brunschwig, Bruce S.0000-0002-6135-6727
Lewis, Nathan S.0000-0001-5245-0538
Additional Information:© 2008 American Chemical Society. Received 29 August 2007. Published online 20 February 2008. Published in print 1 March 2008. This work was supported by the National Science Foundation (CHE-0604894), BP Solar, and the Molecular Materials Research Center of the Beckman Institute at the California Institute of Technology. The authors acknowledge Mr. David Knapp, Mr. David Gleason-Rohrer, and Dr. Stephen Maldonado for insightful discussions and experimental assistance.
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Caltech Beckman InstituteUNSPECIFIED
Issue or Number:6
Record Number:CaltechAUTHORS:20170203-100736727
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Official Citation:Passivation and Secondary Functionalization of Allyl-Terminated Si(111) Surfaces Katherine E. Plass, Xueliang Liu, Bruce S. Brunschwig, and Nathan S. Lewis Chemistry of Materials 2008 20 (6), 2228-2233 DOI: 10.1021/cm7024679
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:74014
Deposited By: Ruth Sustaita
Deposited On:03 Feb 2017 20:46
Last Modified:11 Nov 2021 05:24

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