DeRose, Guy A. and Zhu, Lin and Poon, Joyce K. S. and Yariv, Amnon and Scherer, Axel (2007) Electron-Beam Lithography Techniques for Micro- and Nano-Scale Surface Structure Current Injection Lasers. In: Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies. Optical Society of America , Washington, DC, Paper CThN7. ISBN 1557528349. https://resolver.caltech.edu/CaltechAUTHORS:20170420-124216144
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Abstract
We demonstrate nanoscale patterning and overlay of two-dimensional gratings and waveguides with accuracy better than 45nm using electron-beam lithography for surface structure lasers with large areas.
| Item Type: | Book Section | ||||||
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| Additional Information: | © 2007 OSA. | ||||||
| Classification Code: | OCIS codes: (220.3740) Lithography; (220.4000) Microstructure fabrication; (140.2020) Diode lasers | ||||||
| Record Number: | CaltechAUTHORS:20170420-124216144 | ||||||
| Persistent URL: | https://resolver.caltech.edu/CaltechAUTHORS:20170420-124216144 | ||||||
| Official Citation: | G. A. DeRose, L. Zhu, J. K. S. Poon, A. Yariv, and A. Scherer, "Electron-Beam Lithography Techniques for Micro- and Nano-Scale Surface Structure Current Injection Lasers," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, OSA Technical Digest Series (CD) (Optical Society of America, 2007), paper CThN7. | ||||||
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | ||||||
| ID Code: | 76775 | ||||||
| Collection: | CaltechAUTHORS | ||||||
| Deposited By: | Kristin Buxton | ||||||
| Deposited On: | 20 Apr 2017 20:30 | ||||||
| Last Modified: | 03 Oct 2019 17:49 |
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