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Electron-Beam Lithography Techniques for Micro- and Nano-Scale Surface Structure Current Injection Lasers

DeRose, Guy A. and Zhu, Lin and Poon, Joyce K. S. and Yariv, Amnon and Scherer, Axel (2007) Electron-Beam Lithography Techniques for Micro- and Nano-Scale Surface Structure Current Injection Lasers. In: Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies. Optical Society of America , Washington, DC, Paper CThN7. ISBN 1557528349. https://resolver.caltech.edu/CaltechAUTHORS:20170420-124216144

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Abstract

We demonstrate nanoscale patterning and overlay of two-dimensional gratings and waveguides with accuracy better than 45nm using electron-beam lithography for surface structure lasers with large areas.


Item Type:Book Section
Related URLs:
URLURL TypeDescription
https://www.osapublishing.org/abstract.cfm?uri=cleo-2007-CThN7&origin=searchPublisherArticle
Additional Information:© 2007 OSA.
Classification Code:OCIS codes: (220.3740) Lithography; (220.4000) Microstructure fabrication; (140.2020) Diode lasers
Record Number:CaltechAUTHORS:20170420-124216144
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20170420-124216144
Official Citation:G. A. DeRose, L. Zhu, J. K. S. Poon, A. Yariv, and A. Scherer, "Electron-Beam Lithography Techniques for Micro- and Nano-Scale Surface Structure Current Injection Lasers," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, OSA Technical Digest Series (CD) (Optical Society of America, 2007), paper CThN7.
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:76775
Collection:CaltechAUTHORS
Deposited By: Kristin Buxton
Deposited On:20 Apr 2017 20:30
Last Modified:03 Oct 2019 17:49

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