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Use of Supramolecular Assemblies as Lithographic Resists

Lewis, Scott M. and Fernandez, Antonio and DeRose, Guy A. and Hunt, Matthew S. and Whitehead, George F. S. and Lagzda, Agnese and Alty, Hayden R. and Ferrando-Soria, Jesus and Varey, Sarah and Kostopoulos, Andreas K. and Schedin, Fredrik and Muryn, Christopher A. and Timco, Grigore A. and Scherer, Axel and Yeates, Stephen G. and Winpenny, Richard E. P. (2017) Use of Supramolecular Assemblies as Lithographic Resists. Angewandte Chemie International Edition, 56 (24). pp. 6749-6752. ISSN 1433-7851. http://resolver.caltech.edu/CaltechAUTHORS:20170515-133021292

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Abstract

A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high-resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1002/anie.201700224DOIArticle
http://onlinelibrary.wiley.com/doi/10.1002/anie.201700224/abstractPublisherArticle
Additional Information:© 2017 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim. Manuscript received: January 9, 2017; Revised manuscript received: March 31, 2017; Version of record online: May 15, 2017. We acknowledge the EPSRC (UK) for funding (EP/L018470/1), including a studentship within the Centre for Doctoral Training “NoWNANO” (to S.V.) and a Doctoral Prize (to G.F.S.W.). The University of Manchester also supported this work. We gratefully acknowledge critical support and infrastructure provided for this work by the Kavli Nanoscience Institute at Caltech. Conflict of interest: There are two patents held by three authors (S.M.L., S.G.Y., R.E.P.W.) based on the work described in the paper.
Group:Kavli Nanoscience Institute
Funders:
Funding AgencyGrant Number
Engineering and Physical Sciences Research Council (EPSRC)EP/L018470/1
University of ManchesterUNSPECIFIED
Subject Keywords:heterometallic compounds; lithography; supramolecular assembly; resist materials
Record Number:CaltechAUTHORS:20170515-133021292
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:20170515-133021292
Official Citation:S. M. Lewis, A. Fernandez, G. A. DeRose, M. S. Hunt, G. F. S. Whitehead, A. Lagzda, H. R. Alty, J. Ferrando-Soria, S. Varey, A. K. Kostopoulos, F. Schedin, C. A. Muryn, G. A. Timco, A. Scherer, S. G. Yeates, R. E. P. Winpenny, Angew. Chem. Int. Ed. 2017, 56, 6749
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:77459
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:15 May 2017 23:37
Last Modified:02 Jun 2017 22:52

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