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Fabrication and Replication of Polymer Integrated Optical Devices Using Electron-Beam Lithography and Soft Lithography

Huang, Yanyi and Paloczi, George T. and Yariv, Amnon and Zhang, Cheng and Dalton, Larry R. (2004) Fabrication and Replication of Polymer Integrated Optical Devices Using Electron-Beam Lithography and Soft Lithography. Journal of Physical Chemistry B, 108 (25). pp. 8606-8613. ISSN 1520-6106. doi:10.1021/jp049724d. https://resolver.caltech.edu/CaltechAUTHORS:20170515-151610525

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Abstract

Polymeric integrated optical devices, including microring resonator optical filters and Mach−Zehnder interferometer modulators, fabricated by electron-beam lithography and soft lithography are considered in this article. Microring resonator optical filters made of SU-8 (MicroChem, Newton, MA), directly patterned by electron-beam lithography, demonstrate that SU-8 is a good candidate for high-precision, easily fabricated, and good-optical-quality passive integrated optical devices. Due to the electron-beam lithography process, the coupling between the straight waveguide and the microring resonator is precisely controlled, and the critical coupling condition can be achieved. Additionally, films containing several devices patterned by electron-beam lithography are peeled from the silicon substrate, yielding ultrathin all-polymer flexible free-standing microring resonator optical filters exhibiting up to −27 dB filtering extinction. Using a PDMS stamp, molded from these electron-beam-patterned microring resonator optical filters, identical replicas are fabricated by the soft lithography molding technique. Soft lithography is also applied to active polymer materials. A short 2-mm active-section prototype Mach−Zehnder interferometer modulator is made by the replica molding process, using CLD-1/APC electrooptic polymer as the core material. A reasonable intensity-modulation effect is observed by applying voltage to one arm of the interferometer.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1021/jp049724dDOIArticle
http://pubs.acs.org/doi/abs/10.1021/jp049724dPublisherArticle
ORCID:
AuthorORCID
Zhang, Cheng0000-0001-8288-5823
Additional Information:© 2004 American Chemical Society. Received: January 19, 2004. Publication Date (Web): May 1, 2004. The authors thank J. Poon, Dr. J. Scheuer, Dr. R. Lee, Prof. S. Mookherjea, W. Green, and J. Choi for kind help and fruitful discussion. The work is supported by the National Science Foundation (DMR-0120967) and the Defense Advanced Research Projects Agency (N00014-04-1-0094).
Funders:
Funding AgencyGrant Number
NSFDMR-0120967
Defense Advanced Research Projects Agency (DARPA)UNSPECIFIED
Office of Naval Research (ONR)N00014-04-1-0094
Issue or Number:25
DOI:10.1021/jp049724d
Record Number:CaltechAUTHORS:20170515-151610525
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20170515-151610525
Official Citation:Fabrication and Replication of Polymer Integrated Optical Devices Using Electron-Beam Lithography and Soft Lithography Yanyi Huang, George T. Paloczi, Amnon Yariv, Cheng Zhang, and Larry R. Dalton The Journal of Physical Chemistry B 2004 108 (25), 8606-8613 DOI: 10.1021/jp049724d
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:77467
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:16 May 2017 03:21
Last Modified:15 Nov 2021 17:31

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