Huang, Yanyi and Paloczi, George T. and Yariv, Amnon and Zhang, Cheng and Dalton, Larry R. (2004) Fabrication and Replication of Polymer Integrated Optical Devices Using Electron-Beam Lithography and Soft Lithography. Journal of Physical Chemistry B, 108 (25). pp. 8606-8613. ISSN 1520-6106. doi:10.1021/jp049724d. https://resolver.caltech.edu/CaltechAUTHORS:20170515-151610525
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Abstract
Polymeric integrated optical devices, including microring resonator optical filters and Mach−Zehnder interferometer modulators, fabricated by electron-beam lithography and soft lithography are considered in this article. Microring resonator optical filters made of SU-8 (MicroChem, Newton, MA), directly patterned by electron-beam lithography, demonstrate that SU-8 is a good candidate for high-precision, easily fabricated, and good-optical-quality passive integrated optical devices. Due to the electron-beam lithography process, the coupling between the straight waveguide and the microring resonator is precisely controlled, and the critical coupling condition can be achieved. Additionally, films containing several devices patterned by electron-beam lithography are peeled from the silicon substrate, yielding ultrathin all-polymer flexible free-standing microring resonator optical filters exhibiting up to −27 dB filtering extinction. Using a PDMS stamp, molded from these electron-beam-patterned microring resonator optical filters, identical replicas are fabricated by the soft lithography molding technique. Soft lithography is also applied to active polymer materials. A short 2-mm active-section prototype Mach−Zehnder interferometer modulator is made by the replica molding process, using CLD-1/APC electrooptic polymer as the core material. A reasonable intensity-modulation effect is observed by applying voltage to one arm of the interferometer.
Item Type: | Article | |||||||||
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Additional Information: | © 2004 American Chemical Society. Received: January 19, 2004. Publication Date (Web): May 1, 2004. The authors thank J. Poon, Dr. J. Scheuer, Dr. R. Lee, Prof. S. Mookherjea, W. Green, and J. Choi for kind help and fruitful discussion. The work is supported by the National Science Foundation (DMR-0120967) and the Defense Advanced Research Projects Agency (N00014-04-1-0094). | |||||||||
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Issue or Number: | 25 | |||||||||
DOI: | 10.1021/jp049724d | |||||||||
Record Number: | CaltechAUTHORS:20170515-151610525 | |||||||||
Persistent URL: | https://resolver.caltech.edu/CaltechAUTHORS:20170515-151610525 | |||||||||
Official Citation: | Fabrication and Replication of Polymer Integrated Optical Devices Using Electron-Beam Lithography and Soft Lithography Yanyi Huang, George T. Paloczi, Amnon Yariv, Cheng Zhang, and Larry R. Dalton The Journal of Physical Chemistry B 2004 108 (25), 8606-8613 DOI: 10.1021/jp049724d | |||||||||
Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | |||||||||
ID Code: | 77467 | |||||||||
Collection: | CaltechAUTHORS | |||||||||
Deposited By: | Tony Diaz | |||||||||
Deposited On: | 16 May 2017 03:21 | |||||||||
Last Modified: | 15 Nov 2021 17:31 |
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