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Low-Temperature STM Images of Methyl-Terminated Si(111) Surfaces

Yu, Hongbin and Webb, Lauren J. and Ries, Ryan S. and Solares, Santiago D. and Goddard, William A., III and Heath, James R. and Lewis, Nathan S. (2005) Low-Temperature STM Images of Methyl-Terminated Si(111) Surfaces. Journal of Physical Chemistry B, 109 (2). pp. 671-674. ISSN 1520-6106.

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Low-temperature scanning tunneling microscopy (STM) has been used to image CH3-terminated Si(111) surfaces that were prepared through a chlorination/alkylation procedure. The STM data revealed a well-ordered structure commensurate with the atop sites of an unreconstructed 1 × 1 overlayer on the silicon (111) surface. Images collected at 4.7 K revealed bright spots, separated by 0.18 ± 0.01 nm, which are assigned to adjacent H atoms on the same methyl group. The C−H bonds in each methyl group were observed to be rotated by 7 ± 3° away from the center of an adjacent methyl group and toward an underlying Si atom. Hence, the predominant interaction that determines the surface structure arises from repulsions between hydrogen atoms on neighboring methyl groups, and secondary interactions unique to the surface are also evident.

Item Type:Article
Related URLs:
URLURL TypeDescription
Webb, Lauren J.0000-0001-9999-5500
Solares, Santiago D.0000-0003-0895-8160
Goddard, William A., III0000-0003-0097-5716
Heath, James R.0000-0001-5356-4385
Lewis, Nathan S.0000-0001-5245-0538
Additional Information:© 2005 American Chemical Society. Received 28 May 2004. Published online 16 September 2004. Published in print 1 January 2005. We acknowledge the National Science Foundation, grant CHE-0213589 (N.S.L.), the DARPA Molectronics Program, and the MARCO Materials Structures and Devices Focus Center (J.R.H. and W.A.G.) for their support of this research. L.J.W. thanks the NSF for a graduate fellowship, and we are grateful to L. Henling for assistance with the X-ray diffraction experiments.
Funding AgencyGrant Number
Defense Advanced Research Projects Agency (DARPA)UNSPECIFIED
Microelectronics Advanced Research Corporation (MARCO)UNSPECIFIED
NSF Graduate Research FellowshipUNSPECIFIED
Issue or Number:2
Record Number:CaltechAUTHORS:20170524-143033911
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Official Citation:Low-Temperature STM Images of Methyl-Terminated Si(111) Surfaces Hongbin Yu, Lauren J. Webb, Ryan S. Ries, Santiago D. Solares, William A. Goddard III, James R. Heath, and Nathan S. Lewis The Journal of Physical Chemistry B 2005 109 (2), 671-674 DOI: 10.1021/jp047672m
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:77726
Deposited By: Ruth Sustaita
Deposited On:24 May 2017 21:58
Last Modified:17 Nov 2020 00:35

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