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Investigation of the Reactions during Alkylation of Chlorine-Terminated Silicon (111) Surfaces

Rivillon Amy, Sandrine and Michalak, David J. and Chabal, Yves J. and Wielunski, Leszek and Hurley, Patrick T. and Lewis, Nathan S. (2007) Investigation of the Reactions during Alkylation of Chlorine-Terminated Silicon (111) Surfaces. Journal of Physical Chemistry C, 111 (35). pp. 13053-13061. ISSN 1932-7447. doi:10.1021/jp071793f.

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Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to investigate the reaction of chlorine-terminated Si(111) surfaces with organometallic molecules (Grignard reagents). Although the predominant reaction leads to alkylation, with formation of covalent Si−C bonds, evidenced by a 678 cm^(-1) feature assigned to the Si−C stretch mode, solvents typically used during alkylation (tetrahydrofuran and methanol) can also react with Cl/Si(111) surfaces, either during the alkylation reaction or during the rinsing/cleaning process to form Si−OC_nH_(2n+1) as observed by the presence of a SiO−C stretch mode at 1090 cm^(-1). We also address the origin of some silicon oxidation observed after the methylation or ethylation reactions.

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Michalak, David J.0000-0002-1226-608X
Lewis, Nathan S.0000-0001-5245-0538
Additional Information:© 2007 American Chemical Society. Received: March 5, 2007; In Final Form: May 29, 2007. Publication Date (Web): August 14, 2007. This work was supported by the National Science Foundation (Grant CHE-0415652). The authors are grateful to Lauren J. Webb (Caltech) for fruitful discussions.
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Issue or Number:35
Record Number:CaltechAUTHORS:20170607-101718449
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Official Citation:Investigation of the Reactions during Alkylation of Chlorine-Terminated Silicon (111) Surfaces Sandrine Rivillon Amy, David J. Michalak, Yves J. Chabal, Leszek Wielunski, Patrick T. Hurley, and Nathan S. Lewis The Journal of Physical Chemistry C 2007 111 (35), 13053-13061 DOI: 10.1021/jp071793f
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:77997
Deposited By: Tony Diaz
Deposited On:07 Jun 2017 18:25
Last Modified:15 Nov 2021 17:35

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