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Three-dimensional nanoimprint lithography using two-photon lithography master samples

Saive, Rebecca and Bukowsky, Colton R. and Atwater, Harry A. (2017) Three-dimensional nanoimprint lithography using two-photon lithography master samples. , Pasadena, CA. (Submitted)

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We demonstrate three-dimensional (3-D) nanoimprint lithography using master samples initially structured by two-photon lithography. Complex geometries like micro prisms, micro parabolic concentrators, micro lenses and other micrometer sized objects with nanoscale features are three-dimensionally fabricated using two-photon lithography. Stamps made out of polydimethylsiloxane are then cast using the two-photon lithographically structured samples as master samples. Hereby, expensive serial nano 3-D printing is transformed into scalable parallel 3-D nanoimprint lithography. Furthermore, the transition from two-photon lithography to imprint lithography increases the freedom in substrate and ink choice significantly. We demonstrate printing on textured surfaces as well as residue-free printing with silver ink using capillary action.

Item Type:Report or Paper (Discussion Paper)
Related URLs:
URLURL TypeDescription Paper
Saive, Rebecca0000-0001-7420-9155
Bukowsky, Colton R.0000-0003-3577-8050
Atwater, Harry A.0000-0001-9435-0201
Additional Information:The information, data, or work presented herein was funded in part by the U.S. Department of Energy, Energy Efficiency and Renewable Energy Program, under Award Number DE-EE0006335 and by the Bay Area Photovoltaics Consortium under Award Number DE-EE0004946. We thank Lucas Meza for two-photon lithography advice.
Funding AgencyGrant Number
Department of Energy (DOE)DE-EE0006335
Department of Energy (DOE)DE-EE0004946
Subject Keywords:3-D nanoimprint lithography, 3-D printing, two-photon lithography
Record Number:CaltechAUTHORS:20170619-091636714
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Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:78324
Deposited By: Tony Diaz
Deposited On:19 Jun 2017 16:20
Last Modified:25 Nov 2020 17:48

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