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High-Resolution Synchrotron Photoemission Studies of the Electronic Structure and Thermal Stability of CH_(3-) and C_2H_(5-)functionalized Si(111) Surfaces

Jaeckel, Bengt and Hunger, Ralf and Webb, Lauren J. and Jaegermann, Wolfram and Lewis, Nathan S. (2007) High-Resolution Synchrotron Photoemission Studies of the Electronic Structure and Thermal Stability of CH_(3-) and C_2H_(5-)functionalized Si(111) Surfaces. Journal of Physical Chemistry C, 111 (49). pp. 18204-18213. ISSN 1932-7447. doi:10.1021/jp0751413. https://resolver.caltech.edu/CaltechAUTHORS:20170719-065011465

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Abstract

The relative coverage, thermal stability, and electronic properties of CH_(3-) and C_2H_(5-)functionalized Si(111) surfaces prepared by a two-step chlorination/alkylation procedure have been compared using high-resolution synchrotron photoemission spectroscopy. Whereas the CH_(3-) terminated Si(111) surface showed only one C 2s peak for the occupied σ orbitals, the C 2s spectra of C_2H_(5-)terminated Si(111) surfaces showed a symmetric splitting of the occupied σ orbitals, as expected for an ethyl moiety bonded to the surface. The C_2H_5 termination resulted in an unpinning of the Si surface Fermi level, with a band bending of ∼0.2 eV, and produced a surface dipole potential step of −0.23(15) eV. The observed close-to-flat-band condition is similar to that of CH_3−Si(111) and is consistent with H termination of the non-alkylated Si atop sites in the two-step chlorination/alkylation process. The C_2H_(5-)functionalized Si(111) surfaces decomposed at temperatures >300 °C, whereas CH_3−Si(111) surfaces were stable up to at least 440 °C. The data clearly highlight the similarities and identify some significant differences between the behavior of the CH_3- and C_2H_(5-)functionalized Si(111) surfaces.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1021/jp0751413DOIArticle
ORCID:
AuthorORCID
Webb, Lauren J.0000-0001-9999-5500
Lewis, Nathan S.0000-0001-5245-0538
Additional Information:© 2007 American Chemical Society. Received 2 July 2007. Published online 10 November 2007. Published in print 1 December 2007. We gratefully acknowledge the National Science Foundation, Grant No. CHE-0604894, for support of this work (N.S.L. and L.J.W.) and for providing a graduate research fellowship to L.J.W. W.J. acknowledges the traveling support of the Deutsche Forschungsgemeinschaft, DFG Grant No. JA 85910-1. The BMBF is acknowledged for support for setting up and running SoLiAS at BESSY (Contracts 05 KS1RD1/0 and 05 KS4RD1/0, R.H. and W.J.) and for travelgrants (05 ES3XBA/5). This work was also supported by the European Network of Excellence FAME, WP6.
Funders:
Funding AgencyGrant Number
NSFCHE-0604894
Deutsche Forschungsgemeinschaft (DFG)JA 85910-1
Bundesministerium für Bildung und Forschung (BMBF)05 KS1RD1/0
Bundesministerium für Bildung und Forschung (BMBF)05 KS4RD1/0
Bundesministerium für Bildung und Forschung (BMBF)05 ES3XBA/5
European Network of Excellence FAMEWP6
Issue or Number:49
DOI:10.1021/jp0751413
Record Number:CaltechAUTHORS:20170719-065011465
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20170719-065011465
Official Citation:High-Resolution Synchrotron Photoemission Studies of the Electronic Structure and Thermal Stability of CH3- and C2H5-Functionalized Si(111) Surfaces Bengt Jaeckel, Ralf Hunger, Lauren J. Webb, Wolfram Jaegermann, and Nathan S. Lewis The Journal of Physical Chemistry C 2007 111 (49), 18204-18213 DOI: 10.1021/jp0751413
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:79181
Collection:CaltechAUTHORS
Deposited By: Ruth Sustaita
Deposited On:19 Jul 2017 15:06
Last Modified:15 Nov 2021 17:46

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