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Metal-Catalyzed Vinyl Addition Polymers for 157 nm Resist Applications. 2. Fluorinated Norbornenes: Synthesis, Polymerization, and Initial Imaging Results

Tran, Hoang V. and Hung, Raymond J. and Chiba, Takashi and Yamada, Shintaro and Mrozek, Thomas and Hsieh, Yu-Tsai and Chambers, Charles R. and Osborn, Brian P. and Trinque, Brian C. and Pinnow, Matthew J. and MacDonald, Scott A. and Willson, C. Grant and Sanders, Daniel P. and Connor, Eric F. and Grubbs, Robert H. and Conley, Will (2002) Metal-Catalyzed Vinyl Addition Polymers for 157 nm Resist Applications. 2. Fluorinated Norbornenes: Synthesis, Polymerization, and Initial Imaging Results. Macromolecules, 35 (17). pp. 6539-6549. ISSN 0024-9297. https://resolver.caltech.edu/CaltechAUTHORS:20170724-103027504

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Abstract

Three metal-catalyzed vinyl addition copolymers derived from partially fluorinated norbornenes and tricyclononenes have been synthesized and evaluated for use in formulating photoresists for 157 nm lithography imaging. The transparency of these polymers at 157 nm, as measured by variable angle spectroscopic ellipsometry (VASE), is greatly improved over their nonfluorinated counterparts. The results of preliminary lithographic evaluations of resists formulated from these polymers alone and with the addition of several new fluorinated dissolution inhibitors are presented. Images as small as 70 nm have been printed in some formulations.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1021/ma0122371DOIArticle
http://pubs.acs.org/doi/abs/10.1021/ma0122371PublisherArticle
ORCID:
AuthorORCID
Grubbs, Robert H.0000-0002-0057-7817
Additional Information:© 2002 American Chemical Society. Received 26 December 2001. Published online 11 July 2002. Published in print 1 August 2002. The authors gratefully acknowledge International SEMATECH for financial support of this work. AZ Clariant is acknowledged for donation of key starting materials and photoacid generators. We are indebted to JSR Corp. for support of Mr. Chiba and Shipley Co. for support of Dr. Yamada. SEMATECH employees Danny Miller, Shashi Petel, Vicky Graffenberg, and Georgia Rich are all acknowledged for their help with the imaging work.
Funders:
Funding AgencyGrant Number
Sematech, Inc.UNSPECIFIED
Issue or Number:17
Record Number:CaltechAUTHORS:20170724-103027504
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20170724-103027504
Official Citation:Metal-Catalyzed Vinyl Addition Polymers for 157 nm Resist Applications. 2. Fluorinated Norbornenes:  Synthesis, Polymerization, and Initial Imaging Results Hoang V. Tran, Raymond J. Hung, Takashi Chiba, Shintaro Yamada, Thomas Mrozek, Yu-Tsai Hsieh, Charles R. Chambers, Brian P. Osborn, Brian C. Trinque, Matthew J. Pinnow, Scott A. MacDonald, C. Grant Willson, Daniel P. Sanders, Eric F. Connor, Robert H. Grubbs, and Will Conley Macromolecules 2002 35 (17), 6539-6549 DOI: 10.1021/ma0122371
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:79297
Collection:CaltechAUTHORS
Deposited By: Ruth Sustaita
Deposited On:24 Jul 2017 19:42
Last Modified:03 Oct 2019 18:18

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