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Holographic interference lithography for integrated optics

Ng, Willie W. and Hong, Chi-Shain and Yariv, Amnon (1978) Holographic interference lithography for integrated optics. IEEE Transactions on Electron Devices, 25 (10). pp. 1193-1200. ISSN 0018-9383. doi:10.1109/T-ED.1978.19251.

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In this paper, some of our recent work in the use of holographic interference lithography and various material removal techniques to corrugate thin-film optical waveguides are reviewed. The specific applications of these periodic thin-film devices in the distributed feedback and distributed Bragg reflector semiconductor laser, and as output grating couplers, are described. Recent results in the use and fabrication of chirped and curved-line gratings are also summarized.

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Additional Information:© 1978 IEEE. Manuscript received February 29, 1978; revised June 15,1978. This work was supported by the Air Force Office of Scientific Research and the National Science Foundation.
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Air Force Office of Scientific Research (AFOSR)UNSPECIFIED
Issue or Number:10
Record Number:CaltechAUTHORS:20170807-175352913
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Official Citation:Willie W. Ng, Chi-Shain Hong and A. Yariv, "Holographic interference lithography for integrated optics," in IEEE Transactions on Electron Devices, vol. 25, no. 10, pp. 1193-1200, Oct 1978. doi: 10.1109/T-ED.1978.19251
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:79898
Deposited On:08 Aug 2017 02:52
Last Modified:15 Nov 2021 17:51

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