CaltechAUTHORS
  A Caltech Library Service

Ion implantation in semiconductors

Mayer, J. W. (1973) Ion implantation in semiconductors. In: 1973 International Electron Devices Meeting. IEEE , Piscataway, NJ, pp. 3-5. https://resolver.caltech.edu/CaltechAUTHORS:20170809-160158554

[img] PDF - Published Version
See Usage Policy.

303kB

Use this Persistent URL to link to this item: https://resolver.caltech.edu/CaltechAUTHORS:20170809-160158554

Abstract

Ion implantation is being applied extensively to silicon device technology. Two principle features are utilized- 1) charge control in MOS structures for threshold shift, autoregistration, and complementary wells and 2) distribution control in microwave and bipolar structures. Another feature that has not been extensively exploited is to combine the advantages of the high resolution capabilities of electric beam pattern delineation with the low lateral spread inherent in the implantation process. This talk reviews some of the general features of the characteristics of implanted layers in terms of depth distribution, radiation damage and electron activity. Implantation processes in silicon are reasonably well understood. There remain areas which require further clarification. For compound semiconductors, particularly GaAs, implantation techniques offer attractive possibilities for the fabrication of high frequency devices. In these materials, the substrate temperature during implantation and the dielectric coating required to prevent dissociation during thermal anneal play major roles.


Item Type:Book Section
Related URLs:
URLURL TypeDescription
https://doi.org/10.1109/IEDM.1973.188633DOIArticle
http://ieeexplore.ieee.org/document/1477510/PublisherArticle
Additional Information:© 1973 IEEE.
DOI:10.1109/IEDM.1973.188633
Record Number:CaltechAUTHORS:20170809-160158554
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20170809-160158554
Official Citation:J. W. Mayer, "Ion implantation in semiconductors," 1973 International Electron Devices Meeting, 1973, pp. 3-5. doi: 10.1109/IEDM.1973.188633
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:80044
Collection:CaltechAUTHORS
Deposited By: Kristin Buxton
Deposited On:09 Aug 2017 23:07
Last Modified:15 Nov 2021 17:52

Repository Staff Only: item control page