Humphrey, F. B. and Hasegawa, R. and Clow, H. (1966) Magnetic flux reversal in laminated Ni-Fe films. IEEE Transactions on Magnetics, 2 (3). pp. 557-559. ISSN 0018-9464. doi:10.1109/TMAG.1966.1065923. https://resolver.caltech.edu/CaltechAUTHORS:20170814-175121700
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Abstract
Anomalously fast flux reversal has been observed in films made of Ni-Fe layers separated by SiO. The speed of reversal increases as the number of identical layers of Ni-Fe increases. For a 5-layer film, the anomalous speed is observed in films with the SiO thickness as great as 1600 Å. Reversal time curves presented as a family of curves of 1/τ = fh_┴ with h_s as a parameter have two regions. The high-drive region has a lower slope in the laminated films when compared to the single-layer films. For this family of curves, a switching coefficient S_(w') can be defined, as the inverse slope, in a manner similar to the definition of S_w for 1/τ = f(h_(s)) with h_┴ as a parameter. For films with from two to five layers, Sw' is constant at 1 x 10^(-3) μs and is smaller by an order of magnitude for the single-layer films. A dual loop experiment is used to confirm that coherent rotation is not a dominant mechanism. It is concluded that a model must satisfy the following criteria to successfully describe flux reversal in the laminated films: It must provide rapid flux reversal for fields less than H_k, an insensitivity to transverse fields either constant or pulsed, and an interaction that can survive over a wide range of SiO thicknesses.
Item Type: | Article | |||||||||
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Additional Information: | © 1966 IEEE. Manuscript received April 4, 1966. This paper was presented at the 1966 INTERMAG Conference, Stuttgart, Germany, April 20-22. | |||||||||
Issue or Number: | 3 | |||||||||
DOI: | 10.1109/TMAG.1966.1065923 | |||||||||
Record Number: | CaltechAUTHORS:20170814-175121700 | |||||||||
Persistent URL: | https://resolver.caltech.edu/CaltechAUTHORS:20170814-175121700 | |||||||||
Official Citation: | F. Humphrey, R. Hasegawa and H. Clow, "Magnetic flux reversal in laminated Ni-Fe films," in IEEE Transactions on Magnetics, vol. 2, no. 3, pp. 557-559, September 1966. doi: 10.1109/TMAG.1966.1065923 | |||||||||
Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | |||||||||
ID Code: | 80403 | |||||||||
Collection: | CaltechAUTHORS | |||||||||
Deposited By: | INVALID USER | |||||||||
Deposited On: | 15 Aug 2017 04:18 | |||||||||
Last Modified: | 15 Nov 2021 19:30 |
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