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Additive manufacturing of 3D nano-architected metals

Vyatskikh, Andrey and Delalande, Stéphane and Kudo, Akira and Zhang, Xuan and Portela, Carlos M. and Greer, Julia R. (2018) Additive manufacturing of 3D nano-architected metals. Nature Communications, 9 . Art. No. 593. ISSN 2041-1723. PMCID PMC5807385. doi:10.1038/s41467-018-03071-9.

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Most existing methods for additive manufacturing (AM) of metals are inherently limited to ~20–50 μm resolution, which makes them untenable for generating complex 3D-printed metallic structures with smaller features. We developed a lithography-based process to create complex 3D nano-architected metals with ~100 nm resolution. We first synthesize hybrid organic–inorganic materials that contain Ni clusters to produce a metal-rich photoresist, then use two-photon lithography to sculpt 3D polymer scaffolds, and pyrolyze them to volatilize the organics, which produces a >90 wt% Ni-containing architecture. We demonstrate nanolattices with octet geometries, 2 μm unit cells and 300–400-nm diameter beams made of 20-nm grained nanocrystalline, nanoporous Ni. Nanomechanical experiments reveal their specific strength to be 2.1–7.2 MPa g^(−1) cm^3, which is comparable to lattice architectures fabricated using existing metal AM processes. This work demonstrates an efficient pathway to 3D-print micro-architected and nano-architected metals with sub-micron resolution.

Item Type:Article
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URLURL TypeDescription CentralArticle
Vyatskikh, Andrey0000-0002-6917-6931
Kudo, Akira0000-0002-0830-5509
Zhang, Xuan0000-0002-6155-6825
Portela, Carlos M.0000-0002-2649-4235
Greer, Julia R.0000-0002-9675-1508
Additional Information:© 2018 The Authors. This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit Received: 25 September 2017 Accepted: 17 January 2018. Published online: 09 February 2018. The authors gratefully acknowledge the financial support of JRG’s Vannevar-Bush Faculty Fellowship through the Department of Defense. Author Contributions: A.V., S.D. and J.R.G. conceived the concept. A.V. performed synthesis, fabrication, SEM and EDS characterization. S.D. provided information on how to prepare the photoresist. A.K. performed TEM characterization and analysis. X.Z. and C.M.P. performed nanocompression experiments and analyzed the results. A.V. and J.R.G. wrote the manuscript. All authors commented on the manuscript. J.R.G. supervised the project. Data availability: The data that support the findings of this study are available from the corresponding author upon reasonable request. The authors declare no competing financial interests.
Group:Resnick Sustainability Institute, Rosen Bioengineering Center
Funding AgencyGrant Number
Vannever Bush Faculty FellowshipUNSPECIFIED
PubMed Central ID:PMC5807385
Record Number:CaltechAUTHORS:20180206-130051890
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Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:84690
Deposited By: George Porter
Deposited On:09 Feb 2018 17:36
Last Modified:17 Mar 2022 17:05

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