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Positive and Negative Contrast Lithography on Silver Quantum Dot Monolayers

Henrichs, Sven E. and Sample, Jennifer L. and Shiang, Joe J. and Heath, James R. and Collier, Charles P. and Saykally, Richard J. (1999) Positive and Negative Contrast Lithography on Silver Quantum Dot Monolayers. Journal of Physical Chemistry B, 103 (18). pp. 3524-3528. ISSN 1520-6106. https://resolver.caltech.edu/CaltechAUTHORS:20180302-093117451

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Abstract

Scanning nonlinear optical microscopy, at a resolution of ∼2 μm, was utilized to examine monolayers of alkylthiol-passivated silver nanocrystals. Selected regions of the monolayers were irradiated with a pulse train of picosecond 1064 nm laser pulses, and then the second harmonic generation (SHG) response of those monolayers was recorded in a second scan. Two lithographic processesone leading to a negative contrast SHG image (observed for particles <4 nm diameter) and a second leading to a positive contrast SH G image (observed for larger particles)were found. These processes are explained within the context of literature models that account for particle size dependent energy partitioning.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1021/jp990080xDOIArticle
https://pubs.acs.org/doi/abs/10.1021/jp990080xPublisherArticle
ORCID:
AuthorORCID
Heath, James R.0000-0001-5356-4385
Additional Information:© 1999 American Chemical Society. Received 6 January 1999. Published online 21 April 1999. Published in print 1 May 1999. S.E.H., J.L.S., J.J.S., and J.R.H. acknowledge support from an NSF-GOALI grant. J.R.H. acknowledges support from the Alfred P. Sloan Foundation and from the Packard Foundation. C.P.C. and R.J.S. acknowledge support from the NSF. We would like to acknowledge Stan Williams for initially suggesting the possibility of an ionization process in the write step for large particle monolayers.
Funders:
Funding AgencyGrant Number
NSFUNSPECIFIED
Alfred P. Sloan FoundationUNSPECIFIED
David and Lucile Packard FoundationUNSPECIFIED
Issue or Number:18
Record Number:CaltechAUTHORS:20180302-093117451
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20180302-093117451
Official Citation:Positive and Negative Contrast Lithography on Silver Quantum Dot Monolayers Sven E. Henrichs, Jennifer L. Sample, Joe J. Shiang, James R. Heath, Charles P. Collier, and Richard J. Saykally The Journal of Physical Chemistry B 1999 103 (18), 3524-3528 DOI: 10.1021/jp990080x
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:85061
Collection:CaltechAUTHORS
Deposited By: Ruth Sustaita
Deposited On:02 Mar 2018 21:51
Last Modified:03 Oct 2019 19:26

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