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Photoelectrochemical performance of BiVO_4 photoanodes integrated with [NiFe]-layered double hydroxide water oxidation nanocatalysts

Mueller, Astrid M. and Sinclair, Timothy S. and Gray, Harry B. (2018) Photoelectrochemical performance of BiVO_4 photoanodes integrated with [NiFe]-layered double hydroxide water oxidation nanocatalysts. In: 255th American Chemical Society National Meeting & Exposition, March 18-22, 2018, New Orleans, LA.

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We integrated laser-made highly active nickel iron layered double hydroxide ([NiFe]-LDH) water oxidn. nanocatalysts, which we developed in our group, with BiVO_4 photoanodes and tested their photoelectrochem. performance under simulated sunlight illumination. We demonstrated decreased aggregation and increased photocurrent generation with nanocatalysts that contain dipos. metals ([NiFe]-LDH and cobalt oxide) as citrate surfactant selectively ligated the catalyst nanoparticles. We also optimized catalyst mass loading, which is a tradeoff between most efficient depletion of photogenerated holes that drive catalytic turnover and parasitic light absorption by the catalyst particles. Integrated [NiFe]-LDH-BiVO_4 photoanodes enhanced photocurrent generation by a factor of 3.3 compared to bare BiVO_4. Comparison of photoelectrochem. performance of integrated [NiFe]-LDH-BiVO_4 photoanodes in sulfite-free aq. electrolyte with photocurrent generation of neat BiVO_4 photoanodes in aq. electrolyte with sulfite added as sacrificial hole acceptor showed that two thirds of all photogenerated holes escaped loss processes in our optimized integrated photoanodes. Our systematic integration strategies provide a path towards functional artificial photosynthesis devices.

Item Type:Conference or Workshop Item (Paper)
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Mueller, Astrid M.0000-0002-2785-6808
Gray, Harry B.0000-0002-7937-7876
Additional Information:© 2018 American Chemical Society.
Record Number:CaltechAUTHORS:20180413-155002349
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Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:85855
Deposited By: Tony Diaz
Deposited On:13 Apr 2018 22:55
Last Modified:09 Mar 2020 13:19

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