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Metalorganic chemical vapor deposition of copper from copper(II) dimethylaminoethoxide

Young, V. L. and Cox, D. F. and Davis, M. E. (1993) Metalorganic chemical vapor deposition of copper from copper(II) dimethylaminoethoxide. Chemistry of Materials, 5 (12). pp. 1701-1709. ISSN 0897-4756. doi:10.1021/cm00036a006. https://resolver.caltech.edu/CaltechAUTHORS:20180507-141347382

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Abstract

Copper metal films were grown on single-crystal strontium titanate (100) by the thermal decomposition of copper dimethylamino ethoxide in inert atmosphere at temperatures between 150 and 270 °C. Films grown at 200 °C are copper metal, free from contaminants, while higher temperatures result in significant carbon and oxygen incorporation. Deposition products were identified by Fourier transform infrared spectroscopic analysis of the reactor gas phase in situ and by mass spectroscopic analysis of the reactor exit gas during deposition. At 200 °C, deposition occurs by interdependent β-hydride elimination and reductive elimination reactions which produce (dimethylamino)ethanal, (dimethylamino)ethanol, and copper metal. β-Hydride and reductive elimination reactions are also dominant at 250 "C; however, the competition of ligand fragmentation reactions with the whole-ligand eliminating reactions leads to carbon and oxygen contamination of the copper metal film.


Item Type:Article
Related URLs:
URLURL TypeDescription
https://dx.doi.org/10.1021/cm00036a006DOIArticle
ORCID:
AuthorORCID
Davis, M. E.0000-0001-8294-1477
Additional Information:© 1993 American Chemical Society. Received March 9, 1993. Revised Manuscript Received October 7, 1993. The authors acknowledge Dr. Kirk H. Schulz, currently at the University of North Dakota, for collection of LEED data; Dr. S. B. Desu at Virginia Polytechnic Institute and State University for use of his four-point probe apparatus; Tina A. Handlos and Brian Risch at Virginia Polytechnic Institute and State University for assistance in obtaining SEM photographs; and Kelly E. Matthews and Christopher P. Roy at Virginia Polytechnic Institute and State University for collection of NMR spectra.
Issue or Number:12
DOI:10.1021/cm00036a006
Record Number:CaltechAUTHORS:20180507-141347382
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20180507-141347382
Official Citation:Metalorganic chemical vapor deposition of copper from copper(II) dimethylaminoethoxide V. L. Young, D. F. Cox, and M. E. Davis Chemistry of Materials 1993 5 (12), 1701-1709 DOI: 10.1021/cm00036a006
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:86263
Collection:CaltechAUTHORS
Deposited By: George Porter
Deposited On:07 May 2018 21:55
Last Modified:15 Nov 2021 20:36

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