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Metal nanoparticle arrays for near-field optical lithography

Kik, Pieter G. and Martin, Andrea L. and Maier, Stefan A. and Atwater, Harry A. (2002) Metal nanoparticle arrays for near-field optical lithography. In: Properties of Metal Nanostructures. Proceedings of SPIE. No.4810. Society of Photo-optical Instrumentation Engineers (SPIE) , Bellingham, WA, pp. 7-13. ISBN 0819445789. https://resolver.caltech.edu/CaltechAUTHORS:20180706-152614408

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Abstract

We have recently proposed a new approach to optical lithography that could be used to replicate arrays of metal nanoparticles using broad beam illumination with visible light and standard photoresist. The method relies on resonant excitation of the surface plasmon oscillation in the nanoparticles. When excited at the surface plasmon frequency, a resonantly enhanced dipole field builds up around the nanoparticles. This dipole field is used to locally expose a thin layer of photoresist, generating a replica of the original pattern in the resist. Silver nanoparticles on photoresist can be resonantly excited at wavelengths ranging from 410 nm to 460 nm, allowing for resonantly enhanced exposure of standard g-line photoresist. Finite Difference Time Domain (FDTD) simulations of isolated silver particles on a thin resist layer show that broad beam illumination with p-polarized light at a wavelength of 439 nm can produce features as small as 30 nm, or λ/14. Depending on exposure time lateral spot sizes ranging from 30 to 80 nm with exposure depths ranging from 12 to 45 nm can be achieved. We discuss the effect of particle-particle interactions in the replica formation process. Experiments on low areal density Ag nanoparticle arrays are discussed. Resist layers (thickness 75 nm) in contact with 40 nm Ag nanoparticles were exposed using 410 nm light and were subsequently developed. Atomic Force Microscopy on these samples reveals nanoscale depressions in the resist, providing evidence for plasmon-enhanced resist exposure.


Item Type:Book Section
Related URLs:
URLURL TypeDescription
https://doi.org/10.1117/12.450836DOIArticle
ORCID:
AuthorORCID
Martin, Andrea L.0000-0001-9890-5104
Maier, Stefan A.0000-0002-2210-6290
Atwater, Harry A.0000-0001-9435-0201
Additional Information:© 2002 Society of Photo-Optical Instrumentation Engineers (SPIE). This work was supported by the National Science Foundation and the Air Force Office of Scientific Research.
Funders:
Funding AgencyGrant Number
NSFUNSPECIFIED
Air Force Office of Scientific Research (AFOSR)UNSPECIFIED
Subject Keywords:lithography, contact printing, surface plasmon, nanoparticles, pattern replication, plasmon waveguides
Series Name:Proceedings of SPIE
Issue or Number:4810
Record Number:CaltechAUTHORS:20180706-152614408
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20180706-152614408
Official Citation:Pieter G. Kik, Andrea L. Martin, Stefan A. Maier, Harry A. Atwater, "Metal nanoparticle arrays for near-field optical lithography", Proc. SPIE 4810, Properties of Metal Nanostructures, (4 October 2002); doi: 10.1117/12.450836; https://doi.org/10.1117/12.450836
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:87619
Collection:CaltechAUTHORS
Deposited By: George Porter
Deposited On:09 Jul 2018 15:41
Last Modified:10 Mar 2020 17:51

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