Paul, P. H. and Capewell, D. L. and Goodwin, D. G. (1995) Planar laser-induced fluorescence imaging of Si and SiO during pulsed laser ablation of Si. In: Laser-Induced Thin Film Processing. Proceedings of SPIE. No.2403. Society of Photo-optical Instrumentation Engineers (SPIE) , Bellingham, WA, pp. 39-48. ISBN 0819417505. https://resolver.caltech.edu/CaltechAUTHORS:20180725-160851247
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Abstract
Planar laser induced fluorescence has been used to acquire time sequence images of ground-state, neutral Si and SiO during laser ablation of an Si target in vacuum and in the presence of a background gas at a fluence of 3-4 J/cm^2. The SiO images, taken in air, strongly suggest that the observed SiO is created through reaction of silicon with oxygen at the contact front as the plume expands.
Item Type: | Book Section | ||||||
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Additional Information: | © 1995 Society of Photo-Optical Instrumentation Engineers (SPIE). PHP acknowleges support from the United States Department of Energy, Office of Basic Energy Sciences, Chemical Sciences Division. DLC and DGG acknowledge partial support from a National Science Foundation Presidential Young Investigator grant. | ||||||
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Series Name: | Proceedings of SPIE | ||||||
Issue or Number: | 2403 | ||||||
DOI: | 10.1117/12.206278 | ||||||
Record Number: | CaltechAUTHORS:20180725-160851247 | ||||||
Persistent URL: | https://resolver.caltech.edu/CaltechAUTHORS:20180725-160851247 | ||||||
Official Citation: | Phillip H. Paul, Dale L. Capewell, David G. Goodwin, "Planar laser-induced fluorescence imaging of Si and SiO during pulsed laser ablation of Si", Proc. SPIE 2403, Laser-Induced Thin Film Processing, (10 April 1995); doi: 10.1117/12.206278; https://doi.org/10.1117/12.206278 | ||||||
Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | ||||||
ID Code: | 88277 | ||||||
Collection: | CaltechAUTHORS | ||||||
Deposited By: | George Porter | ||||||
Deposited On: | 30 Jul 2018 17:54 | ||||||
Last Modified: | 16 Nov 2021 00:25 |
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