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Phase-induced amplitude apodization complex-mask coronagraph tolerancing and analysis

Knight, Justin M. and Guyon, Olivier and Lozi, Julien and Jovanovic, Nemanja and Males, Jared R. (2018) Phase-induced amplitude apodization complex-mask coronagraph tolerancing and analysis. In: Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation III. Proceedings of SPIE. No.10706. Society of Photo-optical Instrumentation Engineers (SPIE) , Bellingham, WA, Art. No. 107065O. ISBN 9781510619654. http://resolver.caltech.edu/CaltechAUTHORS:20181128-143703546

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Abstract

Phase-Induced Amplitude Apodization Complex Mask Coronagraphs (PIAACMC) offer high-contrast performance at a small inner-working angle (< 1 λ/D) with high planet throughput (> 70%). The complex mask is a multi-zone, phase-shifting mask comprised of tiled hexagons which vary in depth. Complex masks can be difficult to fabricate as there are many micron-scale hexagonal zones (> 500 on average) with continuous depths ranging over a few microns. Ensuring the broadband PIAACMC design performance carries through to fabricated devices requires that these complex masks are manufactured to within well-defined tolerances. We report on a simulated tolerance analysis of a "toy" PIAACMC design which characterizes the effect of common microfabrication errors on on-axis contrast performance using a simple Monte Carlo method. Moreover, the tolerance analysis provides crucial information for choosing a fabrication process which yields working devices while potentially reducing process complexity. The common fabrication errors investigated are zone depth discretization, zone depth errors, and edge artifacts between zones.


Item Type:Book Section
Related URLs:
URLURL TypeDescription
https://doi.org/10.1117/12.2314139DOIArticle
https://arxiv.org/abs/1807.04379arXivDiscussion Paper
ORCID:
AuthorORCID
Guyon, Olivier0000-0002-1097-9908
Additional Information:© 2018 Society of Photo-Optical Instrumentation Engineers (SPIE). This research is supported in part by a NASA TDEM grant and NSF MRI Award #1625441 (MagAO-X). A portion of the fabrication work was done in the ASU Nanfab Facility. A portion of the fabrication work was done in the Cornell NanoScale Science and Technology Facility.
Funders:
Funding AgencyGrant Number
NASAUNSPECIFIED
NSFAST-1625441
Subject Keywords:stellar coronagraph, PIAACMC, focal plane mask, tolerancing, Monte Carlo
Record Number:CaltechAUTHORS:20181128-143703546
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:20181128-143703546
Official Citation:Justin M. Knight, Justin M. Knight, Olivier Guyon, Olivier Guyon, Julien Lozi, Julien Lozi, Nemanja Jovanovic, Nemanja Jovanovic, Jared R. Males, Jared R. Males, } "Phase-induced amplitude apodization complex-mask coronagraph tolerancing and analysis", Proc. SPIE 10706, Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation III, 107065O (10 July 2018); doi: 10.1117/12.2314139; https://doi.org/10.1117/12.2314139
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:91315
Collection:CaltechAUTHORS
Deposited By: George Porter
Deposited On:28 Nov 2018 23:26
Last Modified:03 Dec 2018 19:28

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