Stacked Wafer Gradient Index Silicon Optics with Integral Anti-reflection Layers

Defrance, F. and Chattopadhyay, G. and Connors, J. and Golwala, S. and Hollister, M. I. and Jung-Kubiak, C. and Padilla, E. and Radford, S. and Sayers, J. and Tong, E. C. and Yoshida, H. (2018) Stacked Wafer Gradient Index Silicon Optics with Integral Anti-reflection Layers. . (Submitted) http://resolver.caltech.edu/CaltechAUTHORS:20190107-095816933

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Abstract

Silicon optics with wide bandwidth anti-reflection (AR) coatings, made of multi-layer textured silicon surfaces, are developed for millimeter and submillimeter wavelengths. Single and double layer AR coatings were designed for an optimal transmission centered on 250 GHz, and fabricated using the DRIE (Deep Reaction Ion Etching) technique. Tests of high resistivity silicon wafers with single-layer coatings between 75 GHz and 330 GHz are presented and compared with the simulations.

Item Type:

Report or Paper (Discussion Paper)

Related URLs:

URL	URL Type	Description
https://arxiv.org/abs/1802.04854	arXiv	Discussion Paper

ORCID:

Author	ORCID
Chattopadhyay, G.	0000-0001-7942-5025
Golwala, S.	0000-0002-1098-7174

Additional Information:

This work was funded by NASA (Grant NNX15AE01G).

Funders:

Funding Agency	Grant Number
NASA	NNX15AE01G

Subject Keywords:

THz, GHz, metasurface, anti-reflection, coating, DRIE, silicon, multilayer, optics

Record Number:

CaltechAUTHORS:20190107-095816933

Persistent URL:

http://resolver.caltech.edu/CaltechAUTHORS:20190107-095816933

Usage Policy:

No commercial reproduction, distribution, display or performance rights in this work are provided.

ID Code:

92106

Collection:

CaltechAUTHORS

Deposited By:

Tony Diaz

Deposited On:

07 Jan 2019 18:34

Last Modified:

07 Jan 2019 18:34

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