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Pressure-Controlled Chemical Vapor Deposition of Graphene as Catalyst for Solar Hydrogen Evolution Reaction

Han, Chih-Pin and Chen, Chih-Jung and Hsu, Chen-Chih and Jena, Anirudha and Chang, Ho and Yeh, Nai-Chang and Hu, Shu-Fen and Liu, Ru-Shi (2019) Pressure-Controlled Chemical Vapor Deposition of Graphene as Catalyst for Solar Hydrogen Evolution Reaction. Catalysis Today, 335 . pp. 395-401. ISSN 0920-5861. http://resolver.caltech.edu/CaltechAUTHORS:20190108-132850870

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Abstract

In the present report, graphene-based catalysts on silicon substrate have been examined as the photocathode for solar hydrogen evolution reaction (HER). Mono-layered graphene has been synthesized through low-pressure chemical vapor deposition (LPCVD), whereas multi-layered graphene has been synthesized by atmospheric pressure chemical vapor deposition (APCVD). Copper foil is used as the substrate. The graphene layer on Cu foil subsequently transferred on to silicon photoabsorber using poly(methyl-2-methylpropenoate) (PMMA). At the initial linear sweep voltammetry (LSV) scan, LPCVD-synthesized graphene-Si (LPCVD-Si) electrode showed an onset potential of −0.65 V and photocurrent of −4.31 mA cm^(−2) (at −0.385 V). On the contrary, the onset potential and photocurrent of APCVD-prepared graphene-Si (APCVD-Si) photocathode are −0.36 V and −28.28 mA cm^(−2) (at −0.385 V), respectively. After the 130th LSV scan, the onset potential and photocurrent of LPCVD-Si improved to −0.39 V and −13.28 mA cm^(−2) (at −0.385 V), respectively. In addition, the onset potential and photocurrent of APCVD-Si photocathode at the LSV 130th scan are enhanced to −0.36 V and −28.28 mA cm^(−2) (at −0.385 V), respectively. The graphene sample grown via LPCVD-Si show stable performance whereas, the graphene obtained via APCVD-Si have higher photocurrent poor stability.


Item Type:Article
Related URLs:
URLURL TypeDescription
https://doi.org/10.1016/j.cattod.2019.01.001DOIArticle
ORCID:
AuthorORCID
Yeh, Nai-Chang0000-0002-1826-419X
Hu, Shu-Fen0000-0001-9561-8206
Liu, Ru-Shi0000-0002-1291-9052
Additional Information:© 2019 Published by Elsevier B.V. Received 1 October 2018, Revised 20 December 2018, Accepted 2 January 2019, Available online 8 January 2019. We thank the financial support from the Ministry of Science and Technology (Contract Nos. MOST 106-2112-M-003-007-MY3 and MOST 107-2113-M-002-008-MY3).
Funders:
Funding AgencyGrant Number
Ministry of Science and Technology (Taipei)106-2112-M-003-007-MY3
Ministry of Science and Technology (Taipei)107-2113-M-002-008-MY3
Record Number:CaltechAUTHORS:20190108-132850870
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:20190108-132850870
Official Citation:Chih-Pin Han, Chih-Jung Chen, Chen-Chih Hsu, Anirudha Jena, Ho Chang, Nai-Chang Yeh, Shu-Fen Hu, Ru-Shi Liu, Pressure-controlled chemical vapor deposition of graphene as catalyst for solar hydrogen evolution reaction, Catalysis Today, Volume 335, 2019, Pages 395-401, ISSN 0920-5861, https://doi.org/10.1016/j.cattod.2019.01.001. (http://www.sciencedirect.com/science/article/pii/S092058611831006X)
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:92141
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:08 Jan 2019 21:45
Last Modified:18 Jul 2019 21:12

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