CaltechAUTHORS
  A Caltech Library Service

Single-step growth of graphene and graphene-based nanostructures by plasma-enhanced chemical vapour deposition

Yeh, Nai-Chang and Hsu, Chen-Chih and Bagley, Jacob and Tseng, Wei-Shiuan (2019) Single-step growth of graphene and graphene-based nanostructures by plasma-enhanced chemical vapour deposition. Nanotechnology, 30 (16). Art. No. 162001. ISSN 0957-4484. http://resolver.caltech.edu/CaltechAUTHORS:20190122-090139696

[img] PDF - Accepted Version
See Usage Policy.

1751Kb

Use this Persistent URL to link to this item: http://resolver.caltech.edu/CaltechAUTHORS:20190122-090139696

Abstract

The realization of many promising technological applications of graphene and graphene-based nanostructures depends on the availability of reliable, scalable, high-yield and low-cost synthesis methods. Plasma enhanced chemical vapor deposition (PECVD) has been a versatile technique for synthesizing many carbon-based materials, because PECVD provides a rich chemical environment, including a mixture of radicals, molecules and ions from hydrocarbon precursors, which enables graphene growth on a variety of material surfaces at lower temperatures and faster growth than typical thermal chemical vapor deposition. Here we review recent advances in the PECVD techniques for synthesis of various graphene and graphene-based nanostructures, including horizontal growth of monolayer and multilayer graphene sheets, vertical growth of graphene nanostructures such as graphene nanostripes with large aspect ratios, direct and selective deposition of monolayer and multi-layer graphene on nanostructured substrates, and growth of multi-wall carbon nanotubes. By properly controlling the gas environment of the plasma, it is found that no active heating is necessary for the PECVD growth processes, and that high-yield growth can take place in a single step on a variety of surfaces, including metallic, semiconducting and insulating materials. Phenomenological understanding of the growth mechanisms are described. Finally, challenges and promising outlook for further development in the PECVD techniques for graphene-based applications are discussed.


Item Type:Article
Related URLs:
URLURL TypeDescription
https://doi.org/10.1088/1361-6528/aafdbfDOIArticle
ORCID:
AuthorORCID
Yeh, Nai-Chang0000-0002-1826-419X
Additional Information:© 2019 IOP Publishing. Received 15 October 2018; Revised 11 December 2018; Accepted 11 January 2019; Accepted Manuscript online 11 January 2019. This work is jointly supported by the National Science Foundation, the Army Research Office, the Rothenberg Innovation Initiative Award at Caltech, and the Kavli Foundation.
Group:Kavli Nanoscience Institute
Funders:
Funding AgencyGrant Number
NSFUNSPECIFIED
Army Research Office (ARO)UNSPECIFIED
Rothenberg Innovation Initiative (RI2)UNSPECIFIED
Kavli FoundationUNSPECIFIED
Subject Keywords:graphene, vertically grown graphene nanostructures (VG-GNs), graphene nanostripes (GNSPs), carbon nanotubes (CNTs), plasma enhanced chemical vapour deposition (PECVD), thermal chemical vapour deposition (T-CVD)
Record Number:CaltechAUTHORS:20190122-090139696
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:20190122-090139696
Official Citation:Nai-Chang Yeh et al 2019 Nanotechnology 30 162001
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:92391
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:22 Jan 2019 20:12
Last Modified:13 Feb 2019 02:13

Repository Staff Only: item control page