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Direct writing of 40-nm features inside fused silica glass with oscillator ultrafast lasers

Wu, Sheng and Wan, Zhaozhi (2003) Direct writing of 40-nm features inside fused silica glass with oscillator ultrafast lasers. In: Micromachining Technology for Micro-Optics and Nano-Optics. Proceedings of SPIE. No.4984. Society of Photo-optical Instrumentation Engineers (SPIE) , Bellingham, WA, pp. 225-229. ISBN 9780819447845. https://resolver.caltech.edu/CaltechAUTHORS:20190221-110519723

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Abstract

With ultra-fast oscillator lasers (less than 1nJ/pulse, 80MHz repetition rate), we propose that we could fabricate features with less than 40nm inside UV transparent material such as fused silica and quartz. The low threshold property of this demonstration could lower the cost of lasers, and improve the throughput of laser machining due to the quasi-CW nature of the laser used. Our initial results shows that damages are observed with threshold as low as 1nJ before the UV objective, and then size is below 1 micron.


Item Type:Book Section
Related URLs:
URLURL TypeDescription
https://doi.org/10.1117/12.477832DOIArticle
Additional Information:© 2003 Society of Photo-Optical Instrumentation Engineers (SPIE).
Subject Keywords:Ultra-fast, laser, fused, silica, glass, 40nm feature, direct writing
Series Name:Proceedings of SPIE
Issue or Number:4984
DOI:10.1117/12.477832
Record Number:CaltechAUTHORS:20190221-110519723
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20190221-110519723
Official Citation:Sheng Wu and Zhaozhi Wan "Direct writing of 40-nm features inside fused silica glass with oscillator ultrafast lasers", Proc. SPIE 4984, Micromachining Technology for Micro-Optics and Nano-Optics, (17 January 2003); doi: 10.1117/12.477832; https://doi.org/10.1117/12.477832
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:93067
Collection:CaltechAUTHORS
Deposited By: George Porter
Deposited On:28 Feb 2019 23:58
Last Modified:16 Nov 2021 16:55

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