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Recrystallized parylene as a mask for silicon chemical etching

Lo, Hsi-wen and Kuo, Wen-Cheng and Yang, Yao-Joe and Tai, Yu-Chong (2008) Recrystallized parylene as a mask for silicon chemical etching. In: 2008 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems. IEEE , Piscataway, NJ, pp. 881-884. ISBN 9781424419074. https://resolver.caltech.edu/CaltechAUTHORS:20190322-120334565

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Abstract

This paper presents the first use of recrystallized parylene as masking material for silicon chemical etch. Recrystallized parylene was obtained by melting parylene C at 350degC for 2 hours. The masking ability of recrystallized parylene was tested in HNA (hydrofluoric acid, nitric acid and acetic acid) solution of various ratios, KOH (potassium hydroxide) solution and TMAH (tetramethylammonium hydroxide) at different temperatures and concentrations. It is found that interface between parylene and the substrate can be attacked, which results in undercuts. Otherwise, recrystallized parylene exhibited good adhesion to silicon, complete protection of unexposed silicon and silicon etching rates comparable to literature data.


Item Type:Book Section
Related URLs:
URLURL TypeDescription
https://doi.org/10.1109/nems.2008.4484464DOIArticle
ORCID:
AuthorORCID
Tai, Yu-Chong0000-0001-8529-106X
Additional Information:© 2008 IEEE. The authors thank all members from Caltech Micromachining Laboratory for their assistance on design, fabrication and testing.
Subject Keywords:parylene; silicon wet etching; recrystallization
Record Number:CaltechAUTHORS:20190322-120334565
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20190322-120334565
Official Citation:Hsi-wen Lo, Wen-Cheng Kuo, Yao-Joe Yang and Yu-Chong Tai, "Recrystallized parylene as a mask for silicon chemical etching," 2008 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, Sanya, 2008, pp. 881-884. doi: 10.1109/NEMS.2008.4484464
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:94055
Collection:CaltechAUTHORS
Deposited By: George Porter
Deposited On:25 Mar 2019 21:17
Last Modified:03 Oct 2019 21:00

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