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Photoresist as a sacrificial layer by dissolution in acetone

Walsh, Ken and Norville, Julie and Tai, Yu-Chong (2001) Photoresist as a sacrificial layer by dissolution in acetone. In: Technical Digest. MEMS 2001. 14th IEEE International Conference on Micro Electro Mechanical Systems. IEEE , Piscataway, NJ, pp. 114-117. ISBN 0-7803-5998-4. https://resolver.caltech.edu/CaltechAUTHORS:20190326-075655700

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Abstract

We report here a detailed study of sacrificial layer dissolution of photoresist by acetone in microchannels. The effects of channel geometry as well as photoresist characteristics such as thermal cycles and UV exposure are considered and tested. Test channels were designed and fabricated ranging in height from 2 µm to 6 µm, widths from 10 µm to 80 µm, and lengths up to 2 mm. Channels were formed by encapsulating a sacrificial photoresist layer between two layers of parylene. Sacrificial layer dissolution in acetone was monitored using time lapse digital photography through a microscope and the captured data plotted and analyzed. The data support a diffusion limited model for photoresist dissolution in acetone. Individual parameters in the diffusion limited model are tested and validated through a number of controlled experiments. These results and the final model are important for the design and fabrication of micro-fluidic systems based on the parylene-photoresist sacrificial system.


Item Type:Book Section
Related URLs:
URLURL TypeDescription
https://doi.org/10.1109/MEMSYS.2001.906492DOIArticle
ORCID:
AuthorORCID
Tai, Yu-Chong0000-0001-8529-106X
Additional Information:© 2001 IEEE. This work is supported by the NSF ERC Center for Neuromorphic Systems Engineering. The authors thank Charles Grosjean and Xing Yang for many helpful discussions.
Funders:
Funding AgencyGrant Number
NSFUNSPECIFIED
Center for Neuromorphic Systems Engineering, CaltechUNSPECIFIED
Record Number:CaltechAUTHORS:20190326-075655700
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20190326-075655700
Official Citation:K. Walsh, J. Norville and Yu-Chong Tai, "Photoresist as a sacrificial layer by dissolution in acetone," Technical Digest. MEMS 2001. 14th IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.01CH37090), Interlaken, Switzerland, 2001, pp. 114-117. doi: 10.1109/MEMSYS.2001.906492
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:94137
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:26 Mar 2019 15:23
Last Modified:03 Oct 2019 21:01

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