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Nanometer gaps by feedback-controlled electromigration

Shih, Victor Chi-Yuan and Zheng, Siyang and Chang, Alan and Tai, Yu-Chong (2003) Nanometer gaps by feedback-controlled electromigration. In: TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers. IEEE , Piscataway, NJ, pp. 1530-1533. ISBN 0-7803-7731-1.

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Nanometer-sized gap (or nanogap) is one of the most fundamental devices in the nanotechnology field. Park et. al., first proposed the open-circuit electromigration method to fabricate nanogaps, but the process is only repeatable if Au film is thinner than 20 nm. To overcome these drawbacks, we develop the feedback-controlled electromigration process and find that not only repeatable nanogaps can be created in thicker film (up to 120 nm or thicker in our experiments), but superior gap size control and topology are obtained. Moreover, we develop two new approaches to make free-standing nanogaps. The tunneling current between the nanogap electrodes was used to demonstrate a sensitive pressure and/or temperature sensor. Finally, we also develop a simple thermal-expansion method to measure the gap size without needing delicate instrument.

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Tai, Yu-Chong0000-0001-8529-106X
Additional Information:© 2003 IEEE. This work is supported by the NSF ERC program at Caltech (Award No. EEC-9402726) and the NSF NIRT project (Award No. ECS-0103559).
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Record Number:CaltechAUTHORS:20190403-145911665
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Official Citation:V. C. -. Shih, Siyang Zheng, A. Chang and Yu-Chong Tai, "Nanometer gaps by feedback-controlled electromigration," TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers (Cat. No.03TH8664), Boston, MA, USA, 2003, pp. 1530-1533 vol.2. doi: 10.1109/SENSOR.2003.1217069
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:94418
Deposited By: Tony Diaz
Deposited On:03 Apr 2019 22:16
Last Modified:16 Nov 2021 17:05

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