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Maximum thickness of amorphous NiZr interlayers formed by a solid-state reaction technique

Meng, W. J. and Nieh, C. W. and Johnson, W. L. (1987) Maximum thickness of amorphous NiZr interlayers formed by a solid-state reaction technique. Applied Physics Letters, 51 (21). pp. 1693-1695. ISSN 0003-6951. doi:10.1063/1.98546.

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Formation of the equilibrium intermetallic compound NiZr in sputter deposited Ni/Zr diffusion couples is suppressed by the formation of a metastable amorphous NiZr alloy until a critical thickness of the amorphous NiZr interlayer is reached. The temperature dependence of this critical thickness is studied experimentally. A phenomenological model based on the premise of interfacial heterogeneous nucleation is proposed to understand the evolution of Ni/Zr diffusion couples.

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Additional Information:© 1987 American Institute of Physics. Received 16 July 1987; accepted 28 September 1987. Technical assistance by C. Garland and C. Ahn is gratefully acknowledged. This work was supported by the U.S. Department of Energy, through contract No. DE-FG03-86ER45242. We thank E.J. Cotts and K. Samwer for helpful discussions.
Issue or Number:21
Record Number:CaltechAUTHORS:MENapl87b
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Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:9883
Deposited By: Tony Diaz
Deposited On:26 Mar 2008
Last Modified:08 Nov 2021 21:02

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