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Published February 2006 | Supplemental Material
Journal Article Open

Patterning Lines by Capillary Flows


We report that capillary flows in an evaporating thin film create line patterns, with widths ranging from a few micrometers to less than 100 nm. Deliberate patterning of such lines requires contact-line pinning and the presence of foaming surfactants. Large-scale photolithography can guide and control these structures by creating pinning points and steering evaporation. We provide demonstrations of this process by making self-assembling lines of colloidal quantum dots and microspheres.

Additional Information

© 2006 American Chemical Society. Received 15 November 2005. Published online 5 January 2006. Published in print 1 February 2006. We thank Heun Jin Lee for helping with optics, Koichi Okamoto for SEM training, and Chris Lacenere, Mike Van Dam, Todd Squires, Sandra Troian, Michael Cross, and Steve Quake for helpful discussions. K.M.C. thanks Caltech for a summer undergrad research fellowship. Funding for this work was provided by the DARPA Optofluidics Center.

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Supplemental Material - nl0522678si20051115_112224.mpg

Supplemental Material - nl0522678si20051115_112447.mpg


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