Welcome to the new version of CaltechAUTHORS. Login is currently restricted to library staff. If you notice any issues, please email coda@library.caltech.edu
Published January 2002 | Published
Book Section - Chapter Open

Photo-patternable gelatin as protection layers in surface micromachinings


This paper describes a newly developed low-temperature photo-patternable Gelatin technology that is useful to produce a thick (greater than 10 microns) Gelatin protecting and strengthening layer for weak MEMS micro-structures. Example demonstrated here is the Gelatin process integrated with the Parylene MEMS technology. What is reported here is the complete processing details and formulae that allow anyone to use Gelatin like photo-resist. We find that it is a chemical-resistant and mechanical-robust material for MEMS applications.

Additional Information

© 2002 IEEE. The authors appreciate the financial support of this work from the National Science Council, Taiwan ROC, with the project number of NSC-89-2217-E-032-001. The authors also want to thank the helps from Mr. Yong Xu and Mr. T.N. Pornsin-Sirirak of the Micromachining group, Caltech, USA.

Attached Files

Published - 00984304.pdf


Files (750.7 kB)
Name Size Download all
750.7 kB Preview Download

Additional details

August 19, 2023
October 20, 2023