Published January 21, 2013 | Version Published
Journal Article Open

Thermal stress in silica-on-silicon disk resonators

Abstract

The thermal expansion mismatch of thermal grown silica on a silicon wafer is well known to induce compressive stress upon cooling from the growth temperature to room temperature. In this Letter, we investigate how this stress impacts silica disk structures by comparison of measurements with both a finite element and an analytical model. The disk structures studied are also whispering gallery optical resonators, and proper control of stress is critical to obtain high-Q resonances. Based on our analysis, thicker oxide layers and proper control of undercut enable ultra-high-Q optical performance and mechanical stability.

Additional Information

© 2013 American Institute of Physics. Received 4 December 2012; accepted 8 January 2013; published online 24 January 2013. We gratefully acknowledge the Defense Advanced Research Projects Agency under the iPhoD program, the Institute for Quantum Information and Matter, an NSF Physics Frontiers Center with support of the Gordon and Betty Moore Foundation, and also the Kavli Nanoscience Institute at Caltech. H.L. thanks the Center for the Physics of Information.

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Published - ApplPhysLett_102_031113.pdf

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Additional details

Identifiers

Eprint ID
37157
Resolver ID
CaltechAUTHORS:20130226-152436926

Funding

Gordon and Betty Moore Foundation
Kavli Nanoscience Institute
Defense Advanced Research Projects Agency (DARPA)
Institute for Quantum Information and Matter (IQIM)
NSF Physics Frontiers Center

Dates

Created
2013-02-26
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Updated
2021-11-09
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Caltech Custom Metadata

Caltech groups
Kavli Nanoscience Institute, Institute for Quantum Information and Matter