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Published October 2008 | metadata_only
Journal Article

Multilayer thin films/substrate system with variable film thickness subjected to non-uniform misfit strains


Current methodologies used to infer thin-film stress from curvature measurements are strictly restricted to stress and curvature states that are assumed to remain uniform over the entire film/substrate system. These methodologies have recently been extended to a single thin film of non-uniform thickness deposited on a substrate and subjected to the non-uniform misfit strain. Such methodologies are extended to multilayer thin films of non-uniform thickness deposited on a substrate in the present study. Each thin film may have its own non-uniform misfit strain and non-uniform thickness. We obtain the film stresses and system curvatures in terms of the misfit strains and thickness in thin films. We derive the film stresses and interface shear stresses in terms of system curvatures and film thicknesses. They all feature a "non-local" dependence on curvatures, which make full-field measurement a necessity for the experimental inference of such stresses.

Additional Information

© 2008 Elsevier B.V. Received 31 March 2008; received in revised form 8 July 2008; accepted 10 July 2008. Available online 15 August 2008.

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August 22, 2023
August 22, 2023