Observation of near-surface damage by phonon scattering
Abstract
We have investigated the feasibility of phonon-reflection techniques as nondestructive means to probe surface and/or near-surface damage in otherwise highly perfect crystals. An UHV liquid-helium stage, suitable for phonon-reflection measurements, was installed on a beam line of a tandem van de Graaff accelerator which was used to implant MeV ions into the substrate in order to modify the surface region in situ. Here, we report our investigation on the effects of 1-MeV Ar+ implantation in Al2O3 single crystals by monitoring the reflection of terahertz (THz) phonons (50-Å wavelength) from the implanted region. The results are compared to other surface techniques. Using a 15-kV ion gun on the same beam line, we have also bombarded Al2O3 crystals coated with thin films of gold. The effects of a 7.5-keV Ar+ beam on this Au-Al2O3 system are also discussed in this paper.
Additional Information
©1988 The American Physical Society Received 23 May 1988 We wish to acknowledge N. N. Asplund, A. P. Rice, F. SCaramuzzi, D. M. Strayer, T. Vreeland, Jr., D. L. Weathers, and F. Xiong for their valuable contributions to the course of this research. This work was supported by U.S. Department of Energy (DOE) Contract No. DE-FG03-85ER-45192. One of us (T.A.T.) was supported in part by the National Science Foundation under Grant No. DMR 86-15641.Attached Files
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Additional details
- Eprint ID
- 5203
- Resolver ID
- CaltechAUTHORS:MABprb88
- Department of Energy (DOE)
- DE-FG03-85ER-45192
- NSF
- DMR 86-15641
- Created
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2006-10-04Created from EPrint's datestamp field
- Updated
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2021-11-08Created from EPrint's last_modified field