Published August 1, 1970 | Version public
Journal Article Open

Observation of propagation cutoff and its control in thin optical waveguides

Abstract

The first observation of optical cutoff in thin-film waveguides is reported. The waveguides consist of thin (~10µ) epitaxial layers of high-resistivity GaAs deposited on lower-resistivity GaAs substrates. The optical cutoff is controlled through the electro-optic effect by applying an electric field across the epitaxial layer.

Additional Information

©1970 The American Institute of Physics. Received 8 June 1970; in final form 15 June 1970. The authors wish to thank A. Shuskus and W. Oshinsky of United Aircraft Research Laboratories in East Hartford, Conn., for supplying the GaAs samples. Research supported by the Office of Naval Research and by the Advanced Research Projects Agency through the Army Research Office, Durham, N.C.

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7482
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CaltechAUTHORS:HALapl70

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2007-02-23
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