Published April 1, 1991
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Journal Article
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Mechanistic investigations of nanometer-scale lithography at liquid-covered graphite surfaces
Abstract
Pulse-induced nanometer-scale lithography has been performed on graphite surfaces that were in contact with pure water or other organic liquids. Very reproducible control over the pit diameter was observed in aqueous solutions, and a well-defined voltage threshold (4.0 ± 0.2 V) was also apparent. Near the threshold voltage, 7 Å diameter × 2 Å high protrusions were formed, while larger initial pulse voltages resulted in pits of diameter> ~20 Å.
Additional Information
© 1991 American Institute of Physics. (Received 13 September 1990; accepted 2 January 1991) We acknowledge the Caltech Consortium in Chemistry and Chemical Engineering; Founding Members: E. I. du Pont de Nemours, Eastman Kodak, 3M, and Shell Development Co. and the Joint Services Electronics Program for support of this work, and Dr. A. Moore of Union Carbide for a generous donation of HOPG. J. Jahanmir at QuanScan Inc. is acknowledged for assistance with Z calibration of the piezo using interferometry. The authors also thank M. Dovek and M. Kirk of Stanford University for valuable conversations regarding experimental results in gaseous ambients. This is contribution No. 8201 from the Division of Chemistry and Chemical Engineering at Caltech.Attached Files
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Identifiers
- Eprint ID
- 2422
- Resolver ID
- CaltechAUTHORS:PENapl91b
Funding
- Caltech Consortium in Chemistry and Chemical Engineering
Dates
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2006-04-03Created from EPrint's datestamp field
- Updated
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2023-04-19Created from EPrint's last_modified field
Caltech Custom Metadata
- Other Numbering System Name
- Caltech Division of Chemistry and Chemical Engineering
- Other Numbering System Identifier
- 8201