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Design of high-power ridge
waveguide 980-nm pump lasers
Michele Goano, Elena Torasso, Ivo Montrosset, Sergio
Pellegrino, M. G. Re, et al.
Michele Goano, Elena Torasso, Ivo Montrosset, Sergio Pellegrino, M. G.
Re, D. Reichenbach, "Design of high-power ridge waveguide 980-nm pump
lasers," Proc. SPIE 2148, Laser Diode Technology and Applications VI, (1
June 1994); doi: 10.1117/12.176643
Event: OE/LASE '94, 1994, Los Angeles, CA, United States
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Design of high power ridge waveguide 980 nm pump lasers
M. Goano, E. Torasso, I. Montrosset
Dipartimento di Elettronica, Politecmco di Tormo, Corso Duca degli Abruzzi 24, 10129 Torino
S. Pellegrino, M. Re, D. Reichenbach
Alcatel—Telettra Research Center, via Trento 30, 20059 Vimercate (MI)
ABSTRACT
The design of ridge waveguide semiconductor pump lasers poses particular simulation problems, since an accurate
modeling of the electric and thermal effects and of the optical guiding capabilities is needed. We developed a
model whose selfconsistent application allows the evaluation of, among the others, the threshold current of the
lasing mode and the gain margin of the higher order modes, the P-I characteristic, the power coupled in the fiber,
and the far field pattern. Particular attention was paid to the experimental verification of the transverse single
mode operation region, and its evolution at high injection levels. The appropriate conditions for operation in the
150—200mW single mode output power range have been found.
1 INTRODUCTION
The InGaAs quantum well (QW) lasers emitting at 980 nm have received a great attention in the last years'
and have progressed rapidly as pumping sources for Er-doped fiber amplifiers and also for application in optical
interconnection networks. Ridge waveguide (RW) Fabry-Perot lasers have been reported with good characteristics
such as low threshold current,2' 3, , but the major problem is in high power regime were single transverse mode
operation should be guaranteed in order to mantain high coupling efficiency with the fiber.
The design of such devices is not simple at all because a careful modeling of all the relevant parameters is
needed; in this paper we present a model were all the effects are introduced and simulated with various degrees of
accuracy. Since our goal was the creation of an easy-to-use software tool for the structural design of such devices
and for the verification of the experimental results, we considered more important to take into account all the
relevant effects, than to model with great care only some of them; this choice allowed to realize a computer code
running also on a PC. In particular we considered:
• the lateral current spreading above the active region;
• the carrier diffusion in the active region;
• the carrier leakage effect from the active region;
• the temperature device model;
• the temperature effect on material characteristics and waveguiding;
• the waveguide properties using the effective index (El) model;
• the transverse mode competition;
• the modal mirror reflectivities;
• the coupling of the laser beam with the fiber.
In the following we describe first how these effects have been represented in our model and then we present some
results of the simulations.
52
ISPIE Vol. 2148
O-8194-1443-3/94/$6.OO
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2 THE ELECTRIC MODEL
The implemented electric model takes into account the lateral current spreading in the resistive layers above the
active region, the carrier diffusion and recombination in the active region, and the current leakage from the active
region.
The results for two analytic models proposed in the literature to take into account the spreading in stripe lasers
have been considered6' in our case the electrode to active layer distance is reduced to the height from the active
layer and the ridge bottom. In Fig. 1 (left) an example of the current injection distribution in the active layer
obtained with the two considered method is shown.
E 5E+008
4E+008
(0
C
•0 3E-i-008
C
(0
c
2E÷008
C?
E
j:
3E+O18
. 2E+018
Figure 1: Junction current density obtained using different spreading models (left); carrier density profile at and
far above threshold (right). In both cases the ridge width is 2 m.
The carrier density profile N(y) is obtained by solving numerically the diffusion equation:8
82
Deff(T)N(y)
R(N(y),T)
qt
vggmat(N,T)P
where the term depending on the photon density P can be neglected in the small-signal operation or for below-
threshold analysis. The carrier recombination has been approximated as:
R = AN + B(T)N2 + C(T)N3
An example of carrier distribution at threshold and far above threshold is shown in Fig. 1 (right), where the effect
of the spatial hole burning is quite clearly shown.
A simple analytical model for the electron current leakage across the heterojunction interface has been also
implemented. It takes into account only the electrons and holes able to pass the barrier between the active region
and the guiding layers.
3 THETHERMALMODEL
The simple traditional model based on a constant thermal resistance:9
4T = RthPth Rth(R512 + VjIj —
P0)
SPIE Vol. 2148 I 53
7E+008
6E+008
5E+018
4E+018
no spreading
:
—Lengyel et al.
____%\\\\\\\\
Yonezu et al
IE÷008
0
.._.
IIth
—-I=lOIthL...
.
.
I
I
I
\
:t::JT
IE+018
0
01
2345678910
01
2 3 4
5
6
7
89
Distance
from
the
center
of
the
ridge
(pm)
Distance
from
the
center
of the
ridge
(pm)
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where Pth 1S
the
thermal generated power, V is the junction voltage, and I is the part of the injected current
which contributes to the heat generation in the active region,9 has been modified to take into account the transverse
distribution of the heat generated by the carrier recombination in the active layer. Therefore the contributions of
Joule effect and recombination have been associated to different thermal resistances:
zT = Rth,Joule R812 + Rth,ricom(X,y) (V,I3 —
P0).
and Rth,ricom(X,Y) has been obtained by solving the heat flux equation with a finite difference scheme.'0
In Fig. 2 a map of the temperature for an actual device is shown; the corresponding thermal resistance profiles
along the junction and in the orthogonal direction are shown in Fig. 3. Since the optical field is well confined around
the active layer and Rth is an almost linear function of x, to save memory only the junction temperature profile
and the temperature derivatives perpendicular to the junction have been used in our simulator. For a defined
structure the previous data have been computed apart, and during the above threshold simulation we supposed
that the temperature distribution remains unchanged in the form but is changing its maximum value according to
the temperature variation in the center of the ridge.
Beside the influence of the temperature on the local active layer parameter characteristics (material gain,
recombination and diffusion coefficients), we considered also the effect on the "bulk" refractive index distribution
throught the simple
=11.41O5K'
ÔT T0=300K
This change affects the field confinement, and has been verified experimentally.
4 THE ELECTROMAGNETIC MODEL
The modal analysis has been carried out using the effective index method. Since the refractive index variation is
much smaller and slower in the transversal y direction we can factorize the electromagnetic problem in depth and
transversal directions. Taking y as a parameter, we solve "for every y" the Helmoltz equation along x:
182
1
+
kon2(x; )]
p,(x;
y) = ki(y)ço1(x; y)
54
ISPIE Vol. 2148
1
1.5
2
Distance from the center of the ndge
(micron)
Figure 2: Typical Rth map.
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