Combinatorial approaches toward patterning nanocrystals
Abstract
A scheme for generating complex, spatially separated patterns of multiple types of semiconducting and/or metallic nanocrystals is presented. The process is based on lithographic patterning of organic monolayers that contain a photolabile protection group and are covalently bound to SiO2 surfaces. The process results in spatially and chemically distinct interaction sites on a single substrate. Nanocrystal assembly occurs with a high selectivity on just one type of site. We report on the production of binary, tertiary, and quatemary patterns of nanocrystals. We highlight and discuss the differences between nanocrystal/substrate assembly and molecule/substrate assembly. Finally, we investigate the assembled structures using photoluminescence and absorption spectroscopy.
Additional Information
© 1998 American Institute of Physics. (Received 7 April 1998; accepted 7 July 1998) This work was part of a joint UCLA/UC Berkeley/Hewlett Packard effort supported by an NSF-GOALI Grant. One of the authors (J.R.H.) also acknowledges support from the David and Lucile Packard Foundation, and a Sloan Fellowship. One of the authors (T.L.V.) would like to thank the Deutsche Forschungsgemeinschaft (DFG) for partial support.Attached Files
Published - VOSjap98.pdf
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Additional details
- Eprint ID
- 3285
- Resolver ID
- CaltechAUTHORS:VOSjap98
- NSF
- David and Lucile Packard Foundation
- Alfred P. Sloan Foundation
- Deutsche Forschungsgemeinschaft (DFG)
- Created
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2006-05-25Created from EPrint's datestamp field
- Updated
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2021-11-08Created from EPrint's last_modified field