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Published June 19, 2017 | Submitted
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Three-dimensional nanoimprint lithography using two-photon lithography master samples


We demonstrate three-dimensional (3-D) nanoimprint lithography using master samples initially structured by two-photon lithography. Complex geometries like micro prisms, micro parabolic concentrators, micro lenses and other micrometer sized objects with nanoscale features are three-dimensionally fabricated using two-photon lithography. Stamps made out of polydimethylsiloxane are then cast using the two-photon lithographically structured samples as master samples. Hereby, expensive serial nano 3-D printing is transformed into scalable parallel 3-D nanoimprint lithography. Furthermore, the transition from two-photon lithography to imprint lithography increases the freedom in substrate and ink choice significantly. We demonstrate printing on textured surfaces as well as residue-free printing with silver ink using capillary action.

Additional Information

The information, data, or work presented herein was funded in part by the U.S. Department of Energy, Energy Efficiency and Renewable Energy Program, under Award Number DE-EE0006335 and by the Bay Area Photovoltaics Consortium under Award Number DE-EE0004946. We thank Lucas Meza for two-photon lithography advice.

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August 19, 2023
October 26, 2023