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Redox Properties of Mixed Methyl/Vinylferrocenyl Mo
nolayers on Si(111) Surfaces
Judith R. C. Lattimer, Bruce S. Brunschwig*, Nathan
S. Lewis*, and Harry B. Gray*
Kavli Nanoscience Institute and Beckman Institute M
olecular Materials Research Center
Division of Chemistry and Chemical Engineering
California Institute of Technology
1200 East California Blvd, Pasadena, California, 91
125, USA.
E-mail:
bsb@caltech.edu
,
nslewis@caltech.edu
,
hbgray@caltech.edu
.
SUPPORTING INFORMATION
SI Figure 1.
Photograph of the assembled Teflon electrochemistr
y working electrode cell
(left) and the disassembled cell (right). The work
ing silicon electrode surface was sealed
by a vitar o-ring with an area of 0.28 cm
2
when the white Teflon cell was screwed into
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the stainless steel base. The back of the silicon
wafer was scratched with a GaIn eutectic
which makes an ohmic contact to the Si. The wafer
was then attached to a Cu foil and
the stainless steel base, which was then used as th
e contact for the working electrode to
the potentiostat. The glass cell was screwed into
the Teflon base, and the reference and
counter electrodes were then placed in the solution
.
SI Figure 2.
High-resolution F 1s and C 1s XPS signals, respect
ively, on pure 4-
fluorostyrene (a,b) and mixed 4-fluorostyrene/methy
l (c,d) Si(111) surfaces.