Welcome to the new version of CaltechAUTHORS. Login is currently restricted to library staff. If you notice any issues, please email coda@library.caltech.edu
Published November 2004 | public
Journal Article

Rapid Prototyping of Site-Specific Nanocontacts by Electron and Ion Beam Assisted Direct-Write Nanolithography


Rapid prototyping of bottom-up nanostructure circuits is demonstrated, utilizing metal deposition and patterning methodology based on combined focused ion and electron beam induced decomposition of a metal−organic precursor gas. Ohmic contacts were fabricated using electron beam deposition, followed by the faster process of ion beam deposition for interconnect formation. Two applications of this method are demonstrated:  three-terminal transport measurements of Y-junction carbon nanotubes and fabrication of nanocircuits for determination of electromechanical degradation of silver nanowires.

Additional Information

© 2004 American Chemical Society. Received May 25, 2004; Revised Manuscript Received September 6, 2004. Publication Date (Web): October 15, 2004. This work was supported by the Office of Science, Basic Energy Sciences, Division of Materials Sciences of the U.S. Department of Energy under Contract No. DE-AC03-76SF00098. We thank Prof. Apparao M. Rao of Clemson University for Y-junction nanotube synthesis. We thank Andrea Tao of the University of California, Berkeley for Ag nanowire synthesis.

Additional details

August 19, 2023
October 20, 2023