Published August 2020 | Version public
Book Section - Chapter

Cryogenic W-Band SiGe BiCMOS Low-Noise Amplifier

  • 1. ROR icon VTT Technical Research Centre of Finland
  • 2. ROR icon California Institute of Technology
  • 3. ROR icon Innovations for High Performance Microelectronics

Abstract

In this paper we present the design, modeling, and on-wafer measurement results of an ultra- wideband cryogenically cooled SiGe low-noise amplifier covering at least 71 to 116 GHz. When cryogenically cooled to 20 K and measured on wafer the SiGe amplifier shows 95-116-K noise temperature from 77 to 116 GHz. This means 6 to 7 times improvement in noise temperature compared to room temperature noise. The measured gain is around 20 dB for frequency range of 71 to 116 GHz with unprecedented low power consumption of 2.8 mW. To the best of authors' knowledge, this is the highest frequency cryogenic SiGe low-noise amplifier and lowest noise performance for silicon amplifiers for W-band reported to date.

Additional Information

© 2020 IEEE. This work was supported through the Academy of Finland under projects MIDERI, HISENS, and MilliRad (decision no 310234, 310879, and 314541, respectively).

Additional details

Identifiers

Eprint ID
106091
DOI
10.1109/ims30576.2020.9223922
Resolver ID
CaltechAUTHORS:20201015-152733092

Related works

Funding

Academy of Finland
310234
Academy of Finland
310879
Academy of Finland
314541

Dates

Created
2020-10-16
Created from EPrint's datestamp field
Updated
2021-11-16
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