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Best, John S. and McCaldin, J. O. (1975) Interfacial impurities and the reaction between Si and evaporated Al. Journal of Applied Physics, 46 (9). pp. 4071-4072. ISSN 0021-8979. doi:10.1063/1.322113. https://resolver.caltech.edu/CaltechAUTHORS:BESjap75

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